Thermal degradation of tantalum-nickel thin film couples
M.H. Tabacniks, A.J. Kellock, et al.
MRS Spring Meeting 1995
Silicon samples implanted with both Ar and As at fluences of 1×1016/cm2 were irradiated with Q-switched Nd double-frequency laser pulses. Reordering of the damaged layers occurs for 30- and 130-keV Ar implants at about 0.6 and 1.3 J/cm2, respectively. An Ar concentration of the order of (1-3)×1020 atoms/cm 3 is retained, while good As substitutionality is observed. The presence of Ar atoms does not seem to inhibit the As-Si reordering during pulsed laser annealing, and likewise the As atoms do not seem to inhibit Ar out-diffusion. This behavior contrasts markedly with the strong coupling found in furnace annealing.
M.H. Tabacniks, A.J. Kellock, et al.
MRS Spring Meeting 1995
J.E.E. Baglin, W.K. Chu
Nuclear Instruments and Methods
S. Maat, A.J. Kellock, et al.
Journal of Magnetism and Magnetic Materials
Alwin E. Michel, M. Numan, et al.
Applied Physics Letters