Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Paper

01 Jul 1987

Kinetics of high-temperature thermal decomposition of Si0 2 on Si(100)

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Abstract

No abstract available.

Paper

Small Signal Capacitance in Ferroelectric HZO: Mechanisms and Physical Insights

Revanth Kodoru, Atanu Saha, et al.

arXiv

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Anomalous large grains in alloyed aluminum thin films I. Secondary grain growth in aluminum-copper films

A. Gangulee, F.M. D'Heurle

Thin Solid Films

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Scanning tunneling microscopy and spectroscopy of thin metal films on the GaAs(110) surface

P. Martensson, R.M. Feenstra

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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Kinetic model for the chemical vapor deposition of tungsten in the silane reduction process

Julian J. Hsieh

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

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