Conference paper
Low temperature 12 ns DRAM
W.H. Henkels, N.C.-C. Lu, et al.
VLSI-TSA 1989
An ion microbeam radiation test system has been built for studying radiation-induced charge collection and single event upsets in advanced semiconductor circuits. With this system, it is possible to direct an ion beam of diameter as small as 1 p.m onto a circuit or test structure with a placement accuracy of 1 μm. The components of the system, and its operation, are described. Applications are described which demonstrate the capabilities of the system. © 1993 IEEE
W.H. Henkels, N.C.-C. Lu, et al.
VLSI-TSA 1989
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