Joseph L. Lenhart, Daniel A. Fischer, et al.
Langmuir
The dynamics of thin films photoresists polymers and incoherent neutron scattering were discussed. The elastic incoherent neutron scattering is used to parametrize changes in the atomic/molecular mobility in lithographic polymers. Results showed that a reduced Debye-Waller factor mean-square atomic displacement in thin model resist films corresponds to a decrease in the reaction front propagation kinetics.
Joseph L. Lenhart, Daniel A. Fischer, et al.
Langmuir
Christopher L. Soles, Eric K. Lin, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Joseph L. Lenhart, Daniel A. Fischer, et al.
Microlithography 2003
Joseph L. Lenhart, Daniel A. Fischer, et al.
Microlithography 2003