A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
In this paper we describe coupled channel calculation for atom-surface scattering for arbitrary potentials. We study, for the first time, the effect of the polarization-van der Waals forces. It is concluded that these forces are important for defining the repulsive part of the atom-metal surface potential. We study the He-Ni (110) system and present good agreement with experimental data for energies between 20 and 250 meV. © 1983.
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Peter J. Price
Surface Science