T.H. Ning, C.M. Osburn, et al.
Applied Physics Letters
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors.
T.H. Ning, C.M. Osburn, et al.
Applied Physics Letters
T.H. Ning
SSDM 1990
B. Chen, A.S. Yapsir, et al.
ICSICT 1995
E. Ganin, T.C. Chen, et al.
IEDM 1990