Ramachandran Muralidhar, Jin Cai, et al.
IEEE T-ED
We report partially depleted silicon-on-insulator p-channel field-effect transistors fabricated with a 32-nm-technology ground rule and featuring SiGe raised source/drain, SiGe channel, and implant-free extension formation process. A respectable drive current of 950 μAm is obtained at an off current of 100 nAμm, VDD = 1V, and a contacted gate pitch of 130 nm. Furthermore, when the transistor width is scaled down to 100 nm, the saturation transconductance increases by about 15%, leading to a drive current of 1100 μAm. © 2006 IEEE.
Ramachandran Muralidhar, Jin Cai, et al.
IEEE T-ED
Yoonmyung Lee, Daeyeon Kim, et al.
IEEE Transactions on VLSI Systems
Tianbing Chen, Marco Bellini, et al.
BCTM 2005
Ali Khakifirooz, Kangguo Cheng, et al.
IEEE Electron Device Letters