PaperLinewidth and underlayer influence on texture in submicrometer-wide Al and AlCu linesJ.L. Hurd, K.P. Rodbell, et al.Applied Physics Letters
Conference paperTunable Workfunction for Fully Silicied Gates (FUSI) and Proposed MechanismsY.-H. Kim, C. Cabral Jr., et al.VLSI-TSA 2006
Conference paperA study of electromigration lifetime for Cu interconnects coated with CoWP, Ta/TaN, or SiC xN yH zC.-K. Hu, D. Canaperi, et al.AMC 2003
PaperThe stability of Si1-xGex strained layers on small-area trench-isolated siliconK. Schonenberg, Siu-Wai Chan, et al.Journal of Materials Research
