H.D. Dulman, R.H. Pantell, et al.
Physical Review B
The preparation of evaporated thin films of largely single-crystalline copper on mica substrates is reported. Most of the exposed copper surface has (111) orientation, as established by grazing incidence x-ray scattering and electrochemical studies. The (111) surface domains are on the order of 300 A in diameter and have a mosaic spread of ca. 0.1°. Underpotential deposition (UPD) shifts for Pb and T1 on these Cu(lll) films are approximately 150 and 300 mV, respectively. T1 is shown to form a UPD bilayer on this substrate. These epitaxial Cu films can be utilized in electrochemical surface/ interface studies. © 1991, The Electrochemical Society, Inc. All rights reserved.
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
P. Alnot, D.J. Auerbach, et al.
Surface Science
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020