K.-L. Lee, C.-K. Hu, et al.
Journal of Applied Physics
It has been found that annealing Pd-Er deposits on a (001) silicon surface results in the formation of isolated submicron islands of Pd2Si with two epitaxially oriented habits. By contrast, when Pd is annealed on a (111) silicon substrate, Pd2Si is formed with full coverage and a specific epitaxy.
K.-L. Lee, C.-K. Hu, et al.
Journal of Applied Physics
K.N. Tu
Scripta Metallurgica
C. Fontaine, T. Okumura, et al.
Journal of Applied Physics
L.T. Shi, K.N. Tu
Journal of Applied Physics