K.A. Chao
Physical Review B
In this study, the effect of Cluster Carbon implantation and thermal annealing for recrystallization on the properties of phosphorus doped Si (Si
K.A. Chao
Physical Review B
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
M. Hargrove, S.W. Crowder, et al.
IEDM 1998