PaperMetastability in 2D self-assembling systemsN.V. Medhekar, V.B. Shenoy, et al.Physical Review Letters
Conference paperUltrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applicationsE. Gusev, C. Cabral Jr., et al.Microelectronic Engineering
PaperMedium energy ion scattering investigation of homoepitaxy on H terminated Si(111)M. Copel, R.M. TrompSurface Science
