R.A. McCorkle, J. Angilello, et al.
Science
The reliability of molten KOH for revealing dislocations intersecting {100} faces of GaAs has been tested using transmission x-ray topography. It is found to be a "faithful" etch.
R.A. McCorkle, J. Angilello, et al.
Science
P.G. McMullin, J.M. Blum, et al.
IEEE JQE
J. Angilello, J.E.E. Baglin, et al.
Journal of Electronic Materials
T.F. Kuech, M.A. Tischler, et al.
Journal of Crystal Growth