Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
Conference paperA divide and conquer strategy for scaling weather simulations with multiple regions of interestPreeti Malakar, Thomas George, et al.SC 2012
Conference paperSemantic interoperability and transformation in enterprise integrationRaymond Wu, Jie LuITA Conference 2007
