Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Analyses have been made to extract the objective interfacialfracture toughness from the peel strength of very thin metallic films. An elastoplastic bending model of the adherend film has been employed in the analyses applying the fracture mechanics concept of steady-state interfacial crack growth. The analytic result finally shown is a universal peel diagram where the objective interfacial fracture toughness is readily readable when the peel strength is known. Experimental results for Cu films on Si and polyimide substrate systems with a Cr interface are also presented. © 1988 by ASME.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
P.C. Pattnaik, D.M. Newns
Physical Review B
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010