Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
The Helios compact synchrotron installed at IBM's Advanced Lithography Facility provides a unique opportunity to obtain compact synchrotron reliability data in an industrial environment. This paper presents data from the first eight months of user oriented operation of the machine. Running and uptime statistics are tabulated, as well as achieved performance parameters. Unscheduled downtime in the various subsystems is described. © 1993.
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Frank Stem
C R C Critical Reviews in Solid State Sciences
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.