DNA sequencing on a chip

G.M. Wallraff; T. Nguyen; Jeff W. Labadie; T. Huynh; P.J. Brock; W.D. Hinsberg; Richard DiPietro; G. McGall

Paper

01 Feb 1997

DNA sequencing on a chip

Abstract

This method, which combines semiconductor manufacturing technology with molecular biology, has been used to build DNA and RNA arrays at densities as high as 10 6 sites/cm 2.

Conference paper

Sensitive polysilane resists for bilayer lithography

G.M. Wallraff, R.D. Miller, et al.

ACS Spring 1991

Paper

Cyclic ureas as solvents for poly(aryl ether) synthesis

Jeff W. Labadie, K.R. Carter, et al.

Polymer Bulletin

Paper

Mechanistic studies of chemically amplified photoresists

W.D. Hinsberg, G.M. Wallraff, et al.

American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

Resolution and etch resistance of a family of 193 nm positive resists

R.D. Allen, I.Y. Wan, et al.

J. Photopolym. Sci. Tech.

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Abstract

Related

Sensitive polysilane resists for bilayer lithography

Cyclic ureas as solvents for poly(aryl ether) synthesis

Mechanistic studies of chemically amplified photoresists

Resolution and etch resistance of a family of 193 nm positive resists