Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The dHvA effect was observed in a Si inversion layer by a modulation technique for constant magnetic field up to 15 T. The expected periodic spikes in dM dn between Landau levels were discerned. However, the predicted quantum plateaus with step of h {combining short stroke overlay}e m*c are not yet observed. © 1984.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
T.N. Morgan
Semiconductor Science and Technology
K.N. Tu
Materials Science and Engineering: A