American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Paper

01 Sep 1997

Cross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation

Paper

A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes

Michael G. Rosenfield, S. Rishton, et al.

Microelectronic Engineering

Conference paper

Multilayer resist systems using polysiloxanes as etch masks

J. Paraszczak, J.M. Shaw, et al.

Microlithography 1983

Paper

High Transconductance and Velocity Overshoot in NMOS Devices at the 0.1-μm Gate-Length Level

George A. Sai-Halasz, Matthew R. Wordeman, et al.

IEEE Electron Device Letters

Paper

Design and Experimental Technology for 0.1-μm Gate-Length Low-Temperature Operation FET's

George A. Sai-Halasz, Matthew R. Wordeman, et al.

IEEE Electron Device Letters

View all publications