George Markowsky
J. Math. Anal. Appl.
No abstract available.
George Markowsky
J. Math. Anal. Appl.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Satoshi Hada
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences