Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper we describe a novel method of eliminating charging during the high resolution SEM inspection and dimensional measurements of x-ray and optical masks. A soluble conducting polymer, polyaniline, is spin-coated on the mask and found to prevent charging even at 15 KV. This method is a non-destructive process in contrast to the commonly used technique of metal deposition, since the polymer can be cleanly removed without any damage to the mask. © 1991.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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SPIE Advances in Semiconductors and Superconductors 1990
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EMC 2001
Frank R. Libsch, Takatoshi Tsujimura
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