C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
We have developed a technique for both mastering and replicating data patterns for potential use in an atomic force microscope (AFM)-based data storage device. The process consists of using electron beam lithography to write data features as small as 50 nm and a photopolymerization process to faithfully replicate the written marks. The replicas can be read using a contact-mode AFM tip on a rotating disk, and no change in the signal is seen after 12 days of continuous reading. © 1997 American Vacuum Society.
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Ellen J. Yoffa, David Adler
Physical Review B