Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
An explicit procedure for obtaining discrete approximations to general, nonlinear, fixed-time, continuous, optimal control problems with no intermediate trajectory constraints is presented. It is proved that, if the associated system of differential equations is linear in the control variable, then the optimal solutions of these approximations converge to extremals of the original continuous problem. © 1971 Plenum Publishing Corporation.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Proceedings of SPIE 1989
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SPIE Advanced Lithography 2010
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