Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
We have investigated the adsorption and reaction of PH3 on Si(111)-(7×7) between 100 and 900 K. The topology, electronic structure, and chemical reactivity of the resulting P-doped surface was studied by ultraviolet photoemission spectroscopy, low-energy electron diffraction, and ion-scattering spectroscopy. The P-doped surface has a P(111)-(1×1) structure where P substitutes for the first Si-layer atoms of the Si(111) surface. This surface has no dangling bonds and is chemically inert. © 1991 The American Physical Society.
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
David B. Mitzi
Journal of Materials Chemistry
Lawrence Suchow, Norman R. Stemple
JES