Ion beam alignment for liquid crystal display fabrication
J. Doyle, P. Chaudhari, et al.
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
A novel reduced mask process is used to fabricate high-resolution high-aperture-ratio 10.5-in. SXCA (1280 × 1024) displays. The process uses copper gate-metallurgy with redundancy, without the need for extra processing steps. The resulting displays have 150-dpi color resolution, an aperture ratio of over 35%, and excellent image quality, making them the first high-resolution displays that are suitable for notebook applications.
J. Doyle, P. Chaudhari, et al.
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
D.Y. Shih, J. Paraszczak, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
E.G. Colgan, R.J. Polastre, et al.
MRS Spring Meeting 1998
Robert L. Melcher, P.M. Alt, et al.
IBM J. Res. Dev