Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
A procedure for the vapor deposition of a thick layer of silicon oxide was developed to confine thin polymer films between two rigid flat walls. For silicon oxide overlayers thicker than ∼ 1.5 μm the deposited silicon oxide layer is mechanically stable against heating above the glass transition temperature of the polymer. Neutron reflectivity measurements show that the interface between the polymer and the deposited silicon oxide is sharp, having a characteristic width of 1.5 nm. © 1994.
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Julian J. Hsieh
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Physical Review B