Experimental 27 ns 1 Mb CMOS high-speed DRAM
S. Dhong, W.H. Henkels, et al.
VLSI Circuits 1989
This paper describes a test pattern for testing DRAM cell data retention that differs from conventional retention time tests. The test pattern is applicable to non-VDD bitline precharge designs, and is specifically designed to test for worst-case subthreshold leakage through the cell access device by holding bit lines in their latched position for extended periods. This action stresses the cell access devices with the worst-case VDSacross them. The reasons to perform this test on a DRAM are reviewed, its advantages over standard retention time tests are described, and its ability to differentiate access device leakage from isolation leakage is discussed. Measured results on a 1-Mb chip are shown, illustrating the test pattern’s effectiveness in screening subthreshold leakage. © 1992 IEEE
S. Dhong, W.H. Henkels, et al.
VLSI Circuits 1989
S.E. Schuster, T.I. Chappell, et al.
VLSI Circuits 1988
D.S. Wen, W.H. Chang, et al.
VLSI-TSA 1991
H. Heinrich, N. Pakdaman, et al.
LEOS 1992