PaperSurface chemistry of the WF6-based chemical vapor deposition of tungstenM.L. Yu, K.Y. Ahn, et al.IBM J. Res. Dev
PaperFormation and crystallization of amorphous silicides at the interface between thin metal and amorphous silicon filmsS.R. Herd, K.Y. Ahn, et al.Thin Solid Films
PaperEffects of biased cosputtering on resistivity and step coverage in tungsten silicide filmsK.W. Choi, K.Y. AhnJVSTA
PaperPreparation and structure of Fe-doped EuO filmsK.Y. Ahn, K.N. Tu, et al.Journal of Applied Physics
