Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The 5th IBM IEEE CAS/EDS AI Compute Symposium, known as (AICS'22), was held for two days (11-12 October 2022) at the IBM T. J. Watson Research Center. The symposium was also supported by the IBM Academy of Technology (https://www.ibm.com/blogs/academy-of-technology/). Dr. Joshi was the interface for CAS and EDS in organizing this successful event. The theme of the symposium was 'Scalability to Sustainability.' In short, the symposium covered a range of topics from device technology to circuits, architecture, algorithms, and sustainability to make innovations for the cloud with an emphasis on green AI.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Apostol Natsev, Alexander Haubold, et al.
MMSP 2007
Xinyi Su, Guangyu He, et al.
Dianli Xitong Zidonghua/Automation of Electric Power Systems
Minkyong Kim, Zhen Liu, et al.
INFOCOM 2008