Robert R (Russ) Robison  Robert R (Russ) Robison photo       

contact information

Manager, TCAD and Emulation Group
Albany, NY
  +1dash5182927486

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Professional Associations

Professional Associations:  IEEE   |  IEEE Electron Devices Society (EDS)


2009

Impact of lateral asymmetric channel doping on 45-nm-technology N-type SOI MOSFETs
Nayfeh, Hasan M and Rovedo, Nivo and Bryant, Andres and Narasimha, Shreesh and Kumar, Arvind and Yu, Xiaojun and Su, Ning and Sleight, Jeffrey W and Robison, Robert R and Rausch, Werner and others
IEEE Transactions on Electron Devices 56(12), 3097--3105, IEEE, 2009
Abstract