Qinghuang Lin  Qinghuang Lin photo       

contact information

Research Staff Member, Project Manager and IBM Master Inventor
Thomas J. Watson Research Center, Yorktown Heights, NY USA
  +1dash914dash945dash2366

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2016


Effects of Cesium Ion-Implantation on Mechanical and Electrical Properties of Organosilicate Low-k Films
W. Li, D. Pei, X. Guo, M. K. Cheng, S. Lee, Qinghuang Lin, S. W. King, and J. L. Shohet
Applied Physics Letters108, 202901, AIP, 2016


2015


Hydrodynamics of Diamond-Shaped Gradient Nanopillar Arrays for Effective DNA Translocation into Nanochannels
Chao Wang, Robert L. Bruce, Elizabeth A. Duch, Jyotica V. Patel, Joshua T. Smith, Yann Astier, Benjamin H. Wunsch, Siddharth Meshram, Armand Galan, Chris Scerbo, Michael A. Pereira, Deqiang Wang, Evan G. Colgan, Qinghuang Lin, and Gustavo Stolovitzky
ACS Nano 9 (2), 2015

Probing the Molecular Structures of Plasma-damaged and Surface-repaired Low-k Dielectrics
Xiaoxian Zhang, John N. Myers, Qinghuang Lin, Jeffery D. Bielefeld and Zhan Chen
Phys. Chem. Chem. Phys.17, 26130-26139, RCS, 2015

Nondestructive in Situ Characterization of Molecular Structures at the Surface and Buried Interface of Silicon-Supported Low-k Dielectric Films
John N. Myers, Xiaoxian Zhang, Jeff Bielefeld, Qinghuang Lin, and Zhan Chen
J. Phys. Chem. B 119 (4), 1736 1746, American Chemical Society, 2015
Abstract


2014

Measurement of bandgap energies in low-k organosilicates
M. T. Nichols, W. Li, D. Pei, G. A. Antonelli, Qinghuang Lin, S. Banna, Y. Nishi, and J. L. Shohet,
J. Appl. Phys.115, 094105, 2014
Abstract

In Situ Observation of Water Behavior at the Surface and Buried Interface of a Low-K Dielectric Film
Xiaoxian Zhang, John N. Myers, Jeffery D. Bielefeld, Qinghuang Lin, and Zhan Chen
ACS Appl. Mater. Interfaces 6 (21), 18951 18961, American Chemical Society, 2014
Abstract


2013

200 mm wafer-scale integration of sub-20 nm sacrificial nanofluidic channels for manipulating and imaging single DNA molecules
C. Wang, S.W. Nam, J.M. Cotte, H. Peng, C.V. Jahnes, D. Wang, R. Bruce, M. Guillorn, L.M. Gignac, W.H. Advocate, C.M. Breslin, M. Brink, J. Bucchignano, E.A. Duch, A. Galan, E. Kratschmer, P.J. Litwinowicz, M.F. Lofaro, W. Price, S.M. Rossnagel, R.D. Gold
2013 IEEE International Electron Devices Meeting, 14.1 (4 pp.)

The effects of plasma exposure and vacuum ultraviolet irradiation on photopatternable low-k dielectric materials
M. T. Nichols, K. Mavrakakis, Q. Lin, and J. L. Shohet
J. Appl. Phys114, 104107 , AIP Publishing LLC, 2013
Abstract

China Semiconductor Technology International Conference 2013 (CSTIC 2013)
Editor(s): Q. Lin, C. Claeys, D. Huang, H. Wu, Y. Kuo, R. Huang, K. Lai, Y. Zhang, Z. Guo, S. Wang, R. Liu, T. Jiang, P. Song, C. Lam, J. Xiong, K. Cheng
China Semiconductor Technology International Conference 2013 (CSTIC 2013), March 19, 2013 - March 21, 2013 , ECS

Advanced Etch Technology for Nanopatterning II
Ying Zhang; Gottlieb S. Oehrlein; Qinghuang Lin
Advanced Etch Technology for Nanopatterning II, SPIE, 2013
San Jose, California, USA | February 24, 2013


2012

The effects of vacuum ultraviolet radiation on low-k dielectric films
H. Sinha, H. Ren, M. T. Nichols, J. L. Lauer, M. Tomoyasu, N. M. Russell, G. Jiang, G. A. Antonelli, N. C. Fuller, S. U. Engelmann, Q. Lin, V. Ryan, Y. Nishi, and J. L. Shohet
J. Appl. Phys. 112(11), 111101, AIP, 2012

China Semiconductor Technology International Conference 2012 (CSTIC 2012)
Q. Lin, C. Claeys, D. Huang, H. Wu, Y. Kuo, R. Huang, K. Lai, Y. Zhang, Z. Guo, S. Wang, R. Liu, T. Jiang, P. Song, C. Lam
China Semiconductor Technology International Conference 2012 (CSTIC 2012) , ECS

The effects of plasma exposure on low-k dielectric materials
J. L. Shohet; H. Ren; M. T. Nichols; H. Sinha; W. Lu; K. Mavrakakis; Q. Lin; N. M. Russell; M. Tomoyasu; G. A. Antonelli; S. U. Engelmann; N. C. Fuller; V. Ryan; Y. Nishi
Advanced Etch Technology for Nanopatterning, Ying Zhang, Editors, 83280I, pp. 83280I--83280I, SPIE, 2012

Quantifying the elasticity and viscosity of geometrically confined polymer films via thermal wrinkling
E.P. Chan, Q. Lin, C.M. Stafford
Journal of Polymer Science Part B: Polymer Physics, Wiley Online Library, 2012

Advanced Etch Technology for Nanopatterning
Y. Zhang, G. Oehrlein, Q. Lin
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, 2012


2011

China Semiconductor Technology International Conference 2011 (CSTIC 2011)
H. Wu, Q. Lin, C. Claeys, D. Huang, Y. Kuo, R. Huang, K. Lai, Y. Zhang, A. Philipossian, R. Liu, T. Jiang, P. Song, S. Xiaoping
Proceedings of China Semiconductor Technology International Conference 2011 (CSTIC 2011), ECS

Facile chemical rearrangement for photopatterning of POSS derivatives
J Rathore, Q Dai, B Davis, M Sherwood, R D Miller, Q Lin, A Nelson
J. Mater. Chem., The Royal Society of Chemistry, 2011

Quantifying the stress relaxation modulus of polymer thin films via thermal wrinkling
E P Chan, S Kundu, Q Lin, C M Stafford
ACS Journal, ACS Publications, 2011


2010

Multilevel integration of patternable low-$\kappa$ material into advanced Cu BEOL
Qinghuang Lin, Shyng-Tsong Chen, Alshakim Nelson, P Brock, S Cohen, B Davis, N Fuller, R Kaplan, R Kwong, E Liniger, others
SPIE Advanced Lithography, pp. 76390J--76390J, 2010

Silsesquioxane-based Photopatternable Porous Low-k Dielectric Materials
A Nelson, J S Rathore, B Davis, P Brock, R Sooriyakumaran, R Miller, Q Lin
MRS Proceedings, 2010

China Semiconductor Technology International Conference 2010 (CSTIC 2010): ECS Transactions: Volume 27
H Wu, Q Lin, C Claeys, D Huang, Y Shi, Y Kuo, R Huang, P Song, F Chen, K Lai, others
2010 - books.google.com, ECS Transactions

Integration of Photo-Patternable Low-kappa Material into Advanced Cu Back-End-Of-The-Line
Q Lin, A Nelson, S T Chen, P Brock, S A Cohen, B Davis, R Kaplan, R Kwong, E Liniger, D Neumayer, others
Japanese Journal of Applied Physics 49(5), 05FB02--05FB02, The Japan Society of Applied Physics, 2010

Patternable low-:material for  greener semiconductor manufacturing
Q Lin, ST Chen, A Nelson, P Brock, S Cohen, B Davis, N Fuller, J Gambino, R Kaplan, R Kwong, others
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on, pp. 975--978

Silsesquioxane-based Photo-Patternable Porous Low-k Dielectric Materials
J S Rathore, B Davis, P Brock, R Sooriyakumaran, R D Miller, Q Lin, A Nelson
MRS Proceedings, 2010

Integration of Photo-Patternable Low-$\kappa$ Material into Advanced Cu Back-End-Of-The-Line
Q Lin, A Nelson, S T Chen, P Brock, S A Cohen, B Davis, R Kaplan, R Kwong, E Liniger, D Neumayer, others
Jap. J. Appl.Phys , 2010

Effect of chain architecture on the viscoelastic properties of polymer films measured via thermal wrinkling
Edwin P. Chan; Qinghuang Lin; Christopher Stafford
33rd Annual Meeting of the Adhesion Society, pp. pp. 329 - 331, 2010

Integrated Miniaturized Materials: From Self-Assembly to Device Integration
C.J. Martinez, J. Cabral, A. Fernandez-Nieves, S. Grego, A. Goyal, Q. Lin, J.J. Urban, J.J. Watkins, A. Saiani, R. Callens, J.H. Collier, A. Donald, W. Murphy, D.H. Gracias, B.A. Grzybowski, P.W.K. Rothemund, O.G. Schmidt, R.R. Naik, P.B. Messersmith, M.M
Mater. Res. Soc. Symp. Proc. Volume 1272, MRS, 2010


Proceedings of China Semiconductor Technology International Conference 2010 (CSTIC 2010)
H. Wu, Q. Lin, C. Claeys, D. Huang, Y. Shi, Y. Kuo, R. Huang, P. Song, F. Chen, K. Lai, W. Wang, T. Jiang, A. Philipossian, S. Krishnan
China Semiconductor Technology International Conference 2010 (CSTIC 2010) , pp. 1173, ECS


2009

Istc/cstic 2009 (cistc)
D Huang, R Huang, C Claeys, H Wu, P Song, K Wu, C Yu, W Wang, T Jiang, Q Lin, others
2009 - books.google.com, ECS Transactions

Materials, processes, and reliability for advanced interconnects for micro-and nanoelectronics: symposium held April 14-17, 2009, San Francisco, California, USA
Q. Lin
2009 - Cambridge University Press, Cambridge University Press

Thermally induced wrinkling in thin-film stacks on patterned substrates
K Srinivasan, S Goyal, T Siegmund, G Subbarayan, Q Lin
IBM Journal of Research and Development 53(3), 12--1, IBM, 2009

Semiconductor Technology -- ISTC/CSTIC Conference Proceedings
D. Huang, R. Huang, , C. Claeys, H. Wu, Peilin Song, K. Wu, W. Wang, T. Jiang, Qinghuang Lin
ISTC/CSTIC Conference Proceedings, 2009

Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings
T Hu, R L Jones, W Wu, E K Lin, Q Lin, D Keane, S Weigand, J Quintana
Journal of Applied Physics 96(4), 1983--1987, AIP, 2009


2007

Physical properties of polymers handbook
Mark, James E
2007 - Springer, Springer
Abstract


Advances in Resist Materials and Processing Technology XXIV
Q Lin
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, 2007

Materials, processes, integration and reliability in advanced interconnects for micro-and nanoelectronics: symposium held April 10-12, 2007, San Francisco, California, USA
Q Lin
2007 - Materials Research Society, Materials Research Society

Properties of Photoresist Polymers
Q Lin
Physical Properties of Polymers Handbook, 965--979, Springer, 2007

Advances in resist materials and processing technology XXIV: 26-28 February, 2007, San Jose, California, USA
Q Lin
2007 - Society of Photo Optical, Society of Photo Optical

Low dielectric constant nanocomposite thin films based on silica nanoparticle and organic thermosets
Q Lin, S A Cohen, L Gignac, B Herbst, D Klaus, E Simonyi, J Hedrick, J Warlaumont, H J Lee, W Wu
Journal of Polymer Science Part B: Polymer Physics 45(12), 1482--1493, Wiley Online Library, 2007


Advances in Resist Materials and Processing Technology XXIV
Q Lin
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, 2007

Low dielectric constant nanocomposite thin films based on silica nanoparticle and organic …
Q Lin, SA Cohen, L Gignac, B Herbst, D Klaus …
Journal of Polymer Science Part B: Polymer Physics, 2007 - interscience.wiley.com


2006

Advances in Resist Technology and Processing XXIII
Q Lin
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, 2006

BEOL Integration of Highly Damage-Resistant Porous Ultra Low-K Material Using Direct CMP and Via-first Process
T Iijima, Q Lin, S Chen, C Labelle, N Fuller, S Ponoth, S Cohen, J Lloyd, D Dunn, C Muzzy, others
Interconnect Technology Conference, 2006 International, pp. 21--23


2005

Application of Nanoindentation to Characterize Fracture in ILD Films Used in the BEOL
E E Simonyi, E Liniger, M Lane, Q Lin, CD Dimitrakopoulos, C Tyberg
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, pp. 139, 2005


2004

Polymers for microelectronics and nanoelectronics
Q Lin, R A Pearson, J C Hedrick, American Chemical Society. Division Polymeric Materials Science of, Engineering
2004 - library.wisc.edu, American Chemical Society


2003

Porous ILD process development for sub 100 nm integration
K. Malone, S.T. Chen, K. Kumar, T. Spooner, S. Mehta, V. McGahay, H. Nye, C. Tyberg, M. Sankar, E. Huang, Q. Lin, N. Fuller, T. Dalton, J.C. Hedrick, and T. Iijima
Advanced Metallization Conference (AMC), 2003

Does line-edge roughness matter?: FEOL and BEOL perspectives
Q Lin, CT Black, C Detavernier, L Gignac, K …
Proceedings of SPIE, 2003 - link.aip.org


2002

Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists
W.S. Huang, R.W. Kwong, W.M. Moreau, R. Lang, D.R. Medeiros, K.E. Petrillo, A.P. Mahorowala, M. Angelopoulos, Q. Lin, J. Dai, others
SPIE's 27th Annual International Symposium on Microlithography, pp. 432--441, 2002

Application of Blends and Side Chain Si-O Copolymers as High Etch Resistant Sub lOOnm E-beam Resists
W S Huang, R Kwong, W Moreau, R Lang, D Mederios, K Petrillo, A Aviram, A Mahorowala, M Angelopoulos, Q Lin, others
Advances in resist technology and processing XIX: 4-6 March, 2002, Santa Clara,[California] USA4690, 432, SPIE

Building high-performance chemically amplified resists with polymer blends
Q Lin, JP Simons, M Angelopoulos, R …
Proceedings of SPIE, 2002 - link.aip.org


2001

Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions
Qinghuang Lin, Dario L Goldfarb, Marie Angelopoulos, Suresh R Sriram, Jeffrey S Moore
26th Annual International Symposium on Microlithography, pp. 78--86, 2001

Characterization of thin and ultrathin polymer and resist films
D L Goldfarb, Q Lin, M Angelopoulos, C L Soles, E K Lin, W L Wu
Advances in resist technology and processing XVIII: 26-28 February, 2001, Santa Clara,[California] USA4345, 335, SPIE

Small-angle neutron scattering measurements for the characterization of lithographically prepared structures
W Wenli, E K Lin, L Qinghuang, M Angelopolous
AIP Conference Proceedings, 2001

Confinement Induced Deviation in Ultra-thin Photoresist Films
C.L. Soles, E.K. Lin, W. Wu, Q. Lin, M. Angelopoulos
CL Soles, EK Lin, W Wu, Q Lin, M Angelopoulos, 2001

Small-angle neutron scattering measurements for the characterization of lithographically …
W Wu, EK Lin, Q Lin, M Angelopolous
AIP Conference Proceedings, 2001 - link.aip.org

Line-edge roughness in positive-tone chemically amplified resists: effect of additives and …
Q Lin, DL Goldfarb, M Angelopoulos, SR …
Proceedings of SPIE, 2001 - link.aip.org

Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering
E K Lin, W Wu, Q Lin, M Angelopoulos
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, pp. 414--422, 2001

When is bilayer thin-film imaging suitable: comparison with single-layer resists
E Coker, RK Leidy, Q Lin, AP Mahorowala, K …
Proceedings of SPIE, 2001 - link.aip.org

Small angle neutron scattering measurements of nanoscale lithographic features
W Wu, E K Lin, Q Lin, M Angelopoulos
POLYMER PREPRINTS-AMERICA- 42(1), 265--266, Division of Polymer Chemistry, American Chemical Society; 1999, 2001

Neutron Reflectivity Measurements for the Interfacial Characterization of Polymer Thin Film Photoresists
E K Lin, C L Soles, W Wu, S K Satija, Q Lin, M Angelopoulos
ncnr.nist.gov, 2001

Characterization of thin and ultrathin polymer and resist films
D L Goldfarb, Q Lin, M Angelopoulos, C L Soles, E K Lin, W L Wu
Advances in resist technology and processing XVIII: 26-28 February, 2001, Santa Clara,[California] USA4345, 335, SPIE


2000


Photo-generated Acid Diffusion in Polymer Photoresist Thin Films
E Lin, C Soles, W L Wu, Q Lin
APS Meeting Abstracts, pp. 23006, 2000

Diffusion and Distribution of Photoacid Generators in Thin Polymer Films
Q LIN, M ANGELOPOULOS, K BABICH, D …
Materials issues and modeling for device …, 2000 - Materials Research Society

Toward controlled resist line-edge roughness: material origin of line-edge roughness in …
Q Lin, R Sooriyakumaran, WS Huang
Proceedings of SPIE, 2000 - link.aip.org

Transfer etching of bilayer resists in oxygen-based plasmas
AP Mahorowala, K Babich, Q Lin, DR Medeiros, K Petrillo, J Simons, M Angelopoulos, R Sooriyakumaran, D Hofer, GW Reynolds, others
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films18, 1411, 2000

Modeling line edge roughness effects in sub 100 nanometer gate length devices
P. Oldiges, Q. Lin, K. Petrillo, M. Sanchez, M. Ieong, M. Hargrove
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on, pp. 131--134


1999

A high resolution 248 nm bilayer resist
Q Lin, K Petrillo, K Babich, D LaTulipe, D Medeiros, A Mahorowala, J Simons, M Angelopoulos, G Wallraff, C Larson, others
Proc, pp. 241--250, 1999

Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly (vinyl alcohol)
J M Havard, S Y Shim, J M J Frechet, Q Lin, D R Medeiros, C G Willson, J D Byers
Chem. Mater 11(3), 719--725, ACS Publications, 1999

A high resolution 248 nm bilayer resist
Q Lin, K Petrillo, K Babich, D LaTulipe, D Medeiros, A Mahorowala, J Simons, M Angelopoulos, G Wallraff, C Larson, others
Proc, pp. 241--250, 1999


1998

Positive bilayer resists for 248 and 193 nm lithography
Ratnam Sooriyakumaran, Gregory M Wallraff, Carl E Larson, Debra Fenzel-Alexander, Richard A DiPietro, Juliann Opitz, Donald C Hofer, DC LaTulipe, John P Simons, Q Lin, others
Proc. SPIE, pp. 219, 1998

Extension of 248 nm optical lithography: a thin film imaging approach
Q. Lin, A. Katnani, T. Brunner, C. DeWan, C. Fairchok, D. Latulipe, J. Simons, K. Petrillo, K. Babich, D.E. Seeger, others
SPIE Proceedings, pp. 278, 1998

Positive-and negative-tone water-processable photoresists: a progress report
WLK Jen, T Rager, Q Lin, C Lenci, JD Byers …
Proceedings of SPIE, 1998 - link.aip.org

Top surface imaging through silylation
S Katz, CG Willson, JD Byers, A Qin, Q Lin
Proceedings of SPIE, 1998 - link.aip.org

Extension of 248-nm optical lithography: a thin film imaging approach
Q Lin, AD Katnani, TA Brunner, C DeWan, C …
Proceedings of SPIE, 1998 - link.aip.org

Positive bilayer resists for 248-and 193-nm lithography
KE Petrillo, K Babich, M Angelopoulos, Q Lin …
Proceedings of SPIE, 1998 - link.aip.org

Etch selectivity of 4SiMA: hydroxystyrene based copolymers. Silicon chemistry for bilayer resist systems
GM Wallraff, CE Larson, R Sooriyakumaran, J Opitz, D Fenzel-Alexander, R DiPietro, D Hofer, G Breyta, M Sherwood, J Muete, others
Journal of Photopolymer Science and Technology 11(4), 673--679, Journal@rchive, 1998


1997


Interactions of a liquid crystalline polymer with polycarbonate and poly (ethylene terephthalate)
Q Lin, A F Yee
Journal of Materials Science 32(15), 3961--3970, Springer, 1997

Structure and morphology of the in situ composites of a liquid crystalline polymer and polycarbonate
X Hu, Q Lin, AF Yee, D Lu
Journal of Microscopy 185(2), 109--116, John Wiley \& Sons, 1997

Effects of crosslinking agent on lithographic performance of negative-tone resists based on …
Q Lin, AD Katnani, CG Willson
Proceedings of SPIE, 1997 - link.aip.org

Evolution of structure and properties of a liquid crystalline epoxy during curing
Q Lin, A F Yee, H J Sue, J D Earls, RE Hefner Jr
Journal of Polymer Science Part B: Polymer Physics 35(14), 2363--2378, Wiley Online Library, 1997

A water-castable, water-developable chemically amplified negative-tone resist
Q Lin, T Steinhausler, L Simpson, M Wilder, D R Medeiros, C G Willson, J Havard, J M J Frechet
Chem. Mater 9(8), 1725--1730, ACS Publications, 1997


1996

Water-soluble resist for environmentally friendly lithography
Q Lin, LL Simpson, T Steinhaeusler, M Wilder …
Proceedings of SPIE, 1996 - link.aip.org

Skin-core morphology ofin situ composites based on polycarbonate and a liquid crystalline polymer
X Hu, Q Lin, AF Yee, D Lu
Journal of Materials Science Letters 15(4), 277--281, Springer, 1996


1994

High performance polymeric materials through liquid crystallinity: in-situ formed polymer composites and novel liquid crystalline epoxy
Q Lin
1994 - University of Michigan, University of Michigan

Elastic modulus of in-situ composites of a liquid crystalline polymer and polycarbonate
Q Lin, A F Yee
Polymer Composites 15(2), 156--162, Wiley Online Library, 1994


High Performance Polymeric Materials Through Liquid Crystallinity: In-situ Formed Polymer …
Q Lin
1994 - University of Michigan

Phase transformations of a liquid crystalline epoxy during curing
Q Lin, A F Yee, J D Earls, R E Hefner Jr, H J Sue
Polymer 35(12), 2679--2682, Elsevier, 1994


1993

Effect of drawing on structure and properties of a liquid crystalline polymer and polycarbonate in-situ composite
Q Lin, J Jho, A F Yee
Polymer Engineering \& Science 33(13), 789--798, Wiley Online Library, 1993


1991

INFLUENCE OF SEQUENCE STRUCTURE ON PROPERTIES OF LIQUID CRYSTALLINE COPOLYMERS
LIN Qinghuang, ZHOU Qixiang, WANG Huifen, LIU Deshan
Acta Polymerica Sinica6, 1991

WAXD STUDY ON WHOLLY AROMATIC RANDOM LIQUID CRYSTALLINE COPOLYESTERS [J]
LIN Qinghuang, WANG Huifen, LIU Deshan, ZHOU Qixiang
Polymeric Materials Science \& Engineering3, 1991


1990

Structure and Transition of Thermotropic Liquid Crystalline Copolyesters
LIN Qinghuang, ZHOU Qixiang, WANG Huifen, LIU Deshan
Journal of Tsinghua University (Science and Technology), 06, 1990

SYNTHESIS AND CHARACTERIZATION OF AROMATIC LIQUID CRYSTALLINE …
W Huifen, LIU Deshan, Qinghuang Lin
Chinese Journal of Polymer Science, 8(3), 23 (1990)


Year Unknown

Neutron Reflectivity Measurements for the Interfacial Characterization of Polymer Thin Film Photoresists
E K Lin, C L Soles, W Wu, S K Satija, Q Lin, M Angelopoulos
ncnr.nist.gov, 0

Confinement Induced Deviation in Ultra-thin Photoresist Films
C L Soles, E K Lin, W Wu, Q Lin, M Angelopoulos
nist.gov, 0

Water-soluble resist for environmentally friendly lithography (Proceedings Paper)
Q Lin, LL Simpson, T Steinhaeusler, M Wilder …
spie.org, 0

Advances in resist technology and processing XXIII(20-22 February 2006, San Jose, …
Q Lin
Proceedings of SPIE, the International Society for … - cat.inist.fr, 0


Top surface imaging through silylation (Proceedings Paper)
S Katz, CG Willson, JD Byers, A Qin, Q Lin
spie.org, 0

Does line-edge roughness matter?: FEOL and BEOL perspectives (Proceedings Paper)
Q Lin, C T Black, C Detavernier, L Gignac, K Guarini, B Herbst, H Kim, P Oldiges, K E Petrillo, M I Sanchez
spie.org, 0

High-resolution 248-nm bilayer resist (Proceedings Paper)
Q Lin, KE Petrillo, K Babich, DC LaTulipe, …
spie.org, 0