Nathan Marchack  Nathan Marchack photo       

contact information

Resarch Staff Member - Advanced Plasma Physics and Process
Thomas J. Watson Research Center, Yorktown Heights, NY USA
  +1dash914dash945dash1081

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Professional Associations

Professional Associations:  American Vacuum Society  |  Electrochemical Society (ECS)  |  Materials Research Society (MRS)

more information

More information:  Prof. Jane Chang, UCLA  |  Nathan Marchack on Youtube


2017

Etching Methods for STT-MRAM
E. J. O'Sullivan, Anthony J Annunziata, Jemima Gonsalves, G. Hu, Eric A Joseph, Raman Kothandaraman, Gen Lauer, Nathan Marchack, J. J. Nowak, R. P. Robertazzi, J. Z. Sun, Thitima Suwannasiri, P. L. Trouilloud, Yu Zhu, D. C. Worledge
ECS Meeting Abstracts MA2017-02(26), 1138
Abstract

Low-current Spin Transfer Torque MRAM
G. Hu, J. J. Nowak, G. Lauer, J. H. Lee, J. Z. Sun, J. Harms, A. Annunziata, S. Brown, W. Chen, Y. H. Kim, N. Marchack, S. Murthy, C. Kothandaraman, E. J. O'Sullivan, J. H. Park, M. Reuter, R. P. Robertazzi, P. L. Trouilloud, Y. Zhu, D. C. Worledge
2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), pp. 1-2
Abstract

Reducing LER in Si and SiN through plasma etch chemistry optimization for photonic waveguide applications
Nathan Marchack, Marwan Khater, Jason Orcutt, Josephine Chang, Steven Holmes, Tymon Barwicz, Swetha Kamlapurkar, William Green, Sebastian Engelmann
Proc. SPIE10149, 101490F-101490F-10, 2017
Abstract

Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
Nathan Marchack, John M. Papalia, Sebastian Engelmann, Eric A. Joseph
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35(5), 05C314, 2017

Solder Mobility for High-Yield Self-Aligned Flip-Chip Assembly
Y. Martin, S. Kamlapurkar, J. W. Nah, N. Marchack, T. Barwicz
2017 IEEE 67th Electronic Components and Technology Conference (ECTC), pp. 667-674
Abstract


2016

Applications for Surface Engineering Using Atomic Layer Etching-Invited Paper
John Papalia, Nathan Marchack, Robert Bruce, Hiroyuki Miyazoe, Sebastian Engelmann, Eric A Joseph
Solid State Phenomena, pp. 41--48, 2016

Evaluation of ALE processes for patterning
J. M. Papalia, N. Marchack, R. L. Bruce, H. Miyazoe, S. U. Engelmann, E. A. Joseph
Proc. SPIE9782, 97820H-97820H-10, 2016
Abstract


2015

STT-MRAM with double magnetic tunnel junctions
G. Hu, J.H. Lee, J.J. Nowak, J.Z. Sun, J. Harms, A. Annunziata, S. Brown, W. Chen, Y.H. Kim, G. Lauer, L. Liu, N. Marchack, S. Murthy, E.J. O'Sullivan, J.H. Park, M. Reuter, R.P. Robertazzi, P.L. Trouilloud, Y. Zhu, D.C. Worledge
Electron Devices Meeting (IEDM), 2015 IEEE International, pp. 26.3.1-26.3.4
Abstract

In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance
Nathan Marchack, Taeseung Kim, Hans-Olof Blom, Jane P. Chang
Journal of Vacuum Science & Technology A 33(3), 2015

Critical BEOL Aspects of the Fabrication of a Thermally-Assisted MRAM Device
E. J. O'Sullivan, Daniel Edelstein, Nathan Marchack, Michael Lofaro, Michael Gaidis, Eric Joseph, Anthony Annunziata, Dirk Pfeiffer, P. L. Trouilloud, Yu Zhu, Steve Holmes, Armand Galan, Adam M. Pyzna, Jemima Gonsalves
ECS Transactions 69(3), 127-137, 2015
Abstract


2014

Recent Advances in Magnetic Tunnel Junction Materials and Stack for Thermally-Assisted Magnetic Random Access Memory
A. Annunziata, P. Trouilloud, S. Bandiera, S. Brown, M. Gaidis, E. Gapihan, E. O'Sullivan, N. Marchack, D. Worledge
APS March Meeting Abstracts, 2014


2013

Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition
Cheng-che Hsu, Nathan Marchack, Ryan M. Martin, Calvin Pham, John Hoang, Jane P. Chang
Journal of Vacuum Science & Technology B 31(4), 2013


2012

Chemical Processing of Materials on Silicon: More Functionality, Smaller Features, and Larger Wafers
Nathan Marchack, Jane P. Chang
Annual Review of Chemical and Biomolecular Engineering 3(1), 235-262, 2012
Abstract   PMID: 22691090


2011

Nanoscale etching and deposition
Nathan Marchack, Jane P Chang
Plasma Processing of Nanomaterials, 1, CRC Press, 2011

Perspectives in nanoscale plasma etching: what are the ultimate limits?
Nathan Marchack, Jane P Chang
Journal of Physics D: Applied Physics 44(17), 174011, 2011
Abstract


2010

Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer
Marja N. Mullings, Han-Bo-Ram Lee, Nathan Marchack, Xirong Jiang, Zhebo Chen, Yelena Gorlin, Kuang-Po Lin, Stacey F. Bent
Journal of The Electrochemical Society 157(12), D600-D604, 2010
Abstract