Miaomiao Wang  Miaomiao Wang photo       

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Characterization and Reliability
Albany Nanotech
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2017

High-k and p-type work function metal first fabrication process having improved annealing process flows
Cho, Jin and Wang, Miaomiao and Zang, Hui
US Patent 9,570,318
Abstract


2015

Dual Fin Integration for Electron and Hole Mobility Enhancement
Zuoguang Liu, Chia-yu Chen, Tenko Yamashita, Miaomiao Wang
Patent US Patent App. 14/630072 Patent