Hiroyuki (Hiro) Miyazoe  Hiroyuki  (Hiro) Miyazoe photo       

contact information

Research Staff Member - Plasma processings
Thomas J. Watson Research Center, Yorktown Heights, NY USA


Professional Associations

Professional Associations:  American Vacuum Society  |  The Japan Society of Applied Physics

more information

More information:  Linkedin Profile  |  Terashma Group - the University of Tokyo  |  Laboratory for Mechanics of Materials and Nanostructures - EMPA


Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
Miyazoe, Hiroyuki and Engelmann, Sebastian U and Guillorn, Michael A and Pei, Dongfei and Li, Weiyi and Lauer, Jason L and Leon Shohet, J and Fuller, Nicholas CM
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35(5), 05C306, AVS, 2017

Electron beam generated plasmas: Characteristics and etching of silicon nitride
Walton, SG and Boris, DR and Hern{\'a}ndez, SC and Lock, EH and Petrova, Tz B and Petrov, GM and Jagtiani, AV and Engelmann, SU and Miyazoe, H and Joseph, EA
Microelectronic Engineering168, 89--96, Elsevier, 2017

Highly selective dry etching of polystyrene-poly (methyl methacrylate) block copolymer by gas pulsing carbon monoxide-based plasmas
Miyazoe, Hiroyuki and Jagtiani, Ashish V and Tsai, Hsin-Yu and Engelmann, Sebastian U and Joseph, Eric A
Journal of Physics D: Applied Physics 50(20), 204001, IOP Publishing, 2017

Directed self-assembly patterning strategies for phase change memory applications
Bruce, Robert L and Fraczak, Gloria and Papalia, John M and Tsai, HsinYu and BrightSky, Matt and Miyazoe, Hiroyuki and Zhu, Yu and Engelmann, Sebastian U and Lung, Hsiang-Lan and Masuda, Takeshi and others
SPIE Advanced Lithography, pp. 101490J--101490J, 2017


Evaluation of ALE processes for patterning
Papalia, JM and Marchack, N and Bruce, RL and Miyazoe, H and Engelmann, SU and Joseph, EA
SPIE Advanced Lithography, pp. 97820H--97820H, 2016

Applications for Surface Engineering Using Atomic Layer Etching-Invited Paper
Papalia, John and Marchack, Nathan and Bruce, Robert and Miyazoe, Hiroyuki and Engelmann, Sebastian and Joseph, Eric A
Solid State Phenomena, pp. 41--48, 2016

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
Tsai, Hsinyu and Miyazoe, Hiroyuki and Vora, Ankit and Magbitang, Teddie and Arellano, Noel and Liu, Chi-Chun and Maher, Michael J and Durand, William J and Dawes, Simon J and Bucchignano, James J and others
SPIE Advanced Lithography, pp. 977910--977910, 2016

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
Jagtiani, Ashish V and Miyazoe, Hiroyuki and Chang, Josephine and Farmer, Damon B and Engel, Michael and Neumayer, Deborah and Han, Shu-Jen and Engelmann, Sebastian U and Boris, David R and Hern{'a}ndez, Sandra C and others
Journal of Vacuum Science & Technology A 34(1), 01B103, AVS: Science & Technology of Materials, Interfaces, and Processing, 2016

Application of cyclic fluorocarbon/argon discharges to device patterning
Metzler, Dominik and Uppireddi, Kishore and Bruce, Robert L and Miyazoe, Hiroyuki and Zhu, Yu and Price, William and Sikorski, Ed S and Li, Chen and Engelmann, Sebastian U and Joseph, Eric A and others
Journal of Vacuum Science & Technology A 34(1), 01B102, AVS: Science & Technology of Materials, Interfaces, and Processing, 2016


Resistivity of copper interconnects beyond the 7 nm node
Pyzyna, A and Bruce, R and Lofaro, M and Tsai, H and Witt, C and Gignac, L and Brink, M and Guillorn, M and Fritz, G and Miyazoe, H and others
VLSI Technology (VLSI Technology), 2015 Symposium on, pp. T120--T121

Defect mitigation of plasma-induced delamination of TiW/Cu from SiN x layer in thin si interposer processing with glass carriers
Sukumaran, Vijay and Tran-Quinn, Thuy and Lubguban, Jorge and Webster, Dave and Hedrick, Brittany and Cox, Harry and Wood, James and Miyazoe, Hiroyuki and Yan, Hongwen and Joseph, Eric and others
2015 IEEE 65th Electronic Components and Technology Conference (ECTC), pp. 916--921

First realization of the piezoelectronic stress-based transduction device
Chang, Josephine B and Miyazoe, Hiroyuki and Copel, Matthew and Solomon, Paul M and Liu, Xiao-Hu and Shaw, Thomas M and Schrott, Alejandro G and Gignac, Lynne M and Martyna, Glenn J and Newns, Dennis M
Nanotechnology 26(37), 375201, IOP Publishing, 2015

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
Tsai, HsinYu and Miyazoe, Hiroyuki and Cheng, Joy and Brink, Markus and Dawes, Simon and Klaus, David and Bucchignano, James and Sanders, Daniel and Joseph, Eric and Colburn, Matthew and others
SPIE Advanced Lithography, pp. 942314--942314, 2015

Pathway to the PiezoElectronic Transduction Logic Device
Paul M Solomon, Brian Bryce, Marcelo Kuroda, Ryan Keech, Smitha Shetty, Thomas Shaw, Matthew Copel, Li-Wen Hung, Alejandro Schrott, Christine Armstrong, others
Nano letters, ACS Publications, 2015


Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme
H Tsai, H Miyazoe, JB Chang, J Pitera, CC Liu, M Brink, I Lauer, J Cheng, S Engelmann, J Rozen, JJ Bucchignano, DP Klaus, S Dawes, L Gignac, C Breslin, EA Joseph, DP Sanders, ME Colburn, MA Guillorn
Electron Devices Meeting (IEDM), 2014 IEEE International


Directed self-assembly pattern generation of basic FinFET circuit constructs
Tsai, H and Miyazoe, Hiroyuki and Cheng, Joy and Pitera, Jed and Liu, Chi-Chun and Holmes, Steven and Sanders, Dan and Joseph, Eric and Liebmann, Lars and Lai, Kafai and others
Proc. SPIE, pp. 8680--32, 2013

Reaction yields of diamondoid synthesis by plasmas generated in supercritical xenon
Sven Stauss, Tomoki Shizuno, Hiroyuki Miyazoe, Eiichiro Kiyooka, Kazuo Terashima
Transactions of the Materials Research Society of Japan 38(4), 619--623, 一般社団法人 日本 MRS, 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications
H Tsai, H Miyazoe, S Engelmann, CC Liu, L Gignac, J Bucchignano, D Klaus, C Breslin, E Joseph, J Cheng, D Sanders, M Guillorn
J. Micro/Nanolith. MEMS MOEMS., 2013

The PiezoElectronic switch: A path to low energy electronics
PM Solomon, B Bryce, R Keech, TM Shaw, M Copel, LW Hung, A Schrott, TN Theis, W Haensch, SM Rossangel, others
Energy Efficient Electronic Systems (E3S), 2013 Third Berkeley Symposium on, pp. 1--2

Advanced Plasma Etch for the 10nm node and Beyond
E. A. Joseph, S. U. Engelmann, H. Miyazoe, R. L. Bruce, M. Nakamura, T. Suzuki, M. Hoinkis, Y Zhang, GS Oehrlein, Q Lin
Advanced Etch Technology For Nanopatterning Ii8685, 2013

Carbon Nanotube Complementary Wrap-Gate Transistors
Aaron D Franklin, Siyuranga O Koswatta, Damon B Farmer, Joshua T Smith, Lynne Gignac, Chris M Breslin, Shu-Jen Han, George S Tulevski, Hiroyuki Miyazoe, Wilfried Haensch, others
Nano letters 13(6), 2490--2495, American Chemical Society, 2013

Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
Hsin-Yu Tsai, Hiroyuki Miyazoe, Sebastian Engelmann, Sarunya Bangsaruntip, Isaac Lauer, Jim Bucchignano, Dave Klaus, Lynne Gignac, Eric Joseph, Joy Cheng, others
SPIE Advanced Lithography, pp. 86850L--86850L, 2013


Scalable and fully self-aligned n-type carbon nanotube transistors with gate-all-around
Aaron D Franklin, Siyuranga O Koswatta, Damon Farmer, George S Tulevski, Joshua T Smith, Hiroyuki Miyazoe, Wilfried Haensch
Electron Devices Meeting (IEDM), 2012 IEEE International, pp. 4--5

Patterning of CMOS Device Structures for 40-80nm Pitches and Beyond
S. U. Engelmann, R. Martin, R. L. Bruce, H. Miyazoe, N. C. M. Fuller, W. S. Graham, E. M. Sikorski, M. Glodde, M. Brink, H. Tsai, J. Bucchignano, D. Klaus, E. Kratschmer, M. A. Guillorn, Y Zhang, G Oehrlein, Q Lin
Advanced Etch Technology For Nanopatterning8328, 2012


Systematic studies on reactive ion etch-induced deformations of organic underlayers
M Glodde, S Engelmann, M Guillorn, S Kanakasabapathy, E Mclellan, CS Koay, Y Yin, M Sankarapandian, JC Arnold, K Petrillo, M Brink, H Miyazoe, E Anuja de Silva, H Yusuff, K Yoon, Y Wei, C Wu, P Rao Varasani
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 2011

Synthesis of Diamondoids by Supercritical Xenon Discharge Plasma
T. Shizuno, H. Miyazoe, K. Saito, S. Stauss, M. Suzuki, T. Sasaki, K. Terashima
Japanese Journal of Applied Physics 50(3), 0207, 2011


Synthesis of sp $\^{}$\{$3$\}$ $ bonded carbon nano materials by supercritical fluid plasma
Shizuno, Tomoki and Stauss, Sven and Miyazoe, Hiroyuki and Nakahara, Sho and Saito, Koya and Suzuki, Minoru and Sasaki, Takehiko and Terashima, Kazuo
Bulletin of the American Physical Society55, APS, 2010

Synthesis of the Higher-Order Diamondoid Hexamantane Using Low-Temperature Plasmas Generated in Supercritical Xenon
Stauss, Sven and Miyazoe, Hiroyuki and Shizuno, Tomoki and Saito, Koya and Sasaki, Takehiko and Terashima, Kazuo
Japanese Journal of Applied Physics 49(7R), 070213, IOP Publishing, 2010

Plasmas in Super critical Fluids -Fundamentals and Applications- 2. Direct Current and Alternate Current Plasmas
H. Miyazoe, S. Stauss, K. Terashima
Journal of Plasma and Nuclear Fusion Research 86(6), 305, 2010
in Japanese

High rate deposition of ZnO thin films by a small-scale inductively coupled argon plasma generated in open air
S. Stauss, Y. Imanishi, H. Miyazoe, K. Terashima
Journal of Physics D: Applied Physics43, 155203, IOP Publishing, 2010

Improving the metallic content of focused electron beam-induced deposits by a scanning electron microscope integrated hydrogen-argon microplasma generator
H. Miyazoe, I. Utke, H. Kikuchi, S. Kiriu, V. Friedli, J. Michler, K. Terashima
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures 28(4), 744--750, AVS, 2010

Localized high-rate deposition of zinc oxide films at atmospheric pressure using inductively coupled microplasma
S. Stauss, Y. Imanishi, H. Miyazoe, K. Terashima
Thin Solid Films 518(19), 5391--5395, Elsevier, 2010

Pulsed Laser Ablation Synthesis of Diamond Molecules in Supercritical Fluids
S. Nakahara, S. Stauss, H. Miyazoe, T. Shizuno, M. Suzuki, H. Kataoka, T. Sasaki, K. Terashima
Applied Physics Express 3(9), 6201, 2010


Development of a dielectric-barrier discharge enhanced microplasma jet
S. Kiriu, H. Miyazoe, F. Takamine, M. Sai, J.H. Choi, T. Tomai, K. Terashima
Applied Physics Letters94, 191502, 2009

Ultrahigh-frequency microplasma jet as a low-power, high-density, and localized ions/radicals source
H. Miyazoe, M. Sai, S. Stauss, K. Terashima
Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films 27(1), 9--12, AVS, 2009


Controlled focused electron beam-induced etching for the fabrication of sub-beam-size nanoholes
H. Miyazoe, I. Utke, J. Michler, K. Terashima
Applied Physics Letters92, 043124, 2008


Size reduction in crystal grains in LiNb 0.5 Ta 0.5 O 3 thin films by controlling nucleation density during thermal plasma spray chemical vapor deposition
Miyazoe, H and Yamaki, T and Kataoka, H and Terashima, K
Thin solid films 515(18), 7269--7274, Elsevier, 2007

Development and Characterization of Thermoelectron Enhanced Microplasma Devices for the Generation of Plasmas in Micro-sized Capillaries
S. Stauss, H. Miyazoe, M. Sai, K. Terashima


Влияние температуры подложки и скорости осаждения на начальный рост тонких пленок ниобата-танталата лития, полученных методом термальной
Кулинич, СА and Yamaki, T and Miyazoe, H and Yamamoto, H and Terashima, K
Физика твердого тела 48(5), 850--857, Физико-технический институт им. АФ Иоффе РАН, 2006

Effect of the substrate temperature and deposition rate on the initial growth of thin lithium niobate-tantalate films deposited from a thermal plasma
SA Kulinich, T. Yamaki, H. Miyazoe, H. Yamamoto, K. Terashima
Physics of the Solid State 48(5), 904--911, Springer, 2006

Graphoepitaxy of sexithiophene on thermally oxidized silicon surface with artificial periodic grooves
S. Ikeda, K. Saiki, K. Tsutsui, T. Edura, Y. Wada, H. Miyazoe, K. Terashima, K. Inaba, T. Mitsunaga, T. Shimada
Applied physics letters88, 251905, 2006

Effect of annealing on the mobility and morphology of thermally activated pentacene thin film transistors
D. Guo, S. Ikeda, K. Saiki, H. Miyazoe, K. Terashima
Journal of applied physics99, 094502, 2006

The influence of process parameters on precursor evaporation for alumina nanopowder synthesis in an inductively coupled rf thermal plasma
JW Shin, H. Miyazoe, M. Leparoux, S. Siegmann, JL Dorier, C. Hollenstein
Plasma Sources Science and Technology15, 441, IOP Publishing, 2006