Martha I. Sanchez  Martha I. Sanchez photo       

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Characterization of Materials for Microelectronics
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash2276

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2006

Patterning~ 20nm half-pitch lines on silicon using a self-assembled organosilicate etch mask
Linnea Sundstr\"om, Leslie Krupp, Eugene Delenia, Charles Rettner, Martha Sanchez, Mark W Hart, Ho-Cheol Kim, Ying Zhang
Applied physics letters 88(24), 243107, AIP Publishing, 2006

Robust Nanopatterns from Self-Assembly of a Diblock Copolymer and an Inorganic Precursor
H.C. Kim, L. Sundstrom, L. Krupp, E. Delenia, C. Rettner, M. Sanchez, M. Hart, Y. Zhang
Bulletin of the American Physical Society, APS, 2006


2005

Contact mechanics of a flexible imprinter for photocured nanoimprint lithography
GM McClelland, CT Rettner, MW Hart, KR Carter, MI Sanchez, ME Best, BD Terris
Tribology Letters 19(1), 59--63, Springer, 2005

The micro to nano addressing block (mnab)
K. Gopalakrishnan, RS Shenoy, CT Rettner, RS King, Y. Zhang, B. Kurdi, LD Bozano, JJ Welser, ME Rothwell, M. Jurich, others
Electron Devices Meeting, 2005. IEDM Technical Digest. IEEE International, pp. 471--474


2004

Acid--base reactions in a positive tone chemically amplified photoresist and their effect on imaging
FA Houle, WD Hinsberg, MI Sanchez
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures22, 747, 2004

Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
GM Wallraff, DR Medeiros, M. Sanchez, K. Petrillo, W.S. Huang, C. Rettner, B. Davis, CE Larson, L. Sundberg, PJ Brock, others
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures22, 3479, 2004


2003

Advances in Resist Technology and Processing XX (Proceedings Volume)
W.D. Hinsberg, F.A. Houle, M.I. Sanchez, J.A. Hoffnagle, G.M. Wallraff, D.R. Medeiros, G.M. Gallatin, J.L. Cobb
2003 - spie.org

PATTERNING CHALLENGES WITH THIN RESISTS
AP MAHOROWALA, DL GOLDFARB, K. TEMPLE, S. RASGON, HH SAWIN, SD ALLEN, RN LANG, MI SANCHEZ, H. ITO
Proc Int Symp Dry Process, pp. 89--97, 2003

Use of interferometric lithography to characterize the spatial resolution of a photoresist film
J.A. Hoffnagle, W.D. Hinsberg, F.A. Houle, M.I. Sanchez
Journal of Photopolymer Science and Technology 16(3), 373--379, J-STAGE, 2003


2002

Kinetic model for positive tone resist dissolution and roughening
FA Houle, WD Hinsberg, MI Sanchez
Macromolecules 35(22), 8591--8600, ACS Publications, 2002

Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
WD Hinsberg, FA Houle, GM Poliskie, D. Pearson, MI Sanchez, H. Ito
The Journal of Physical Chemistry A 106(42), 9776--9787, ACS Publications, 2002

Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
C.V. Nguyen, R.M.D. Stevens, J. Barber, J. Han, M. Meyyappan, M.I. Sanchez, C. Larson, W.D. Hinsberg
Applied physics letters81, 901, 2002

Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, MI Sanchez, JA Hoffnagle
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures20, 924, 2002

High numerical aperture lithographic imagery at the Brewster angle
T.A. Brunner, N. Seong, W.D. Hinsberg, J.A. Hoffnagle, F.A. Houle, M.I. Sanchez
Journal of Microlithography, Microfabrication, and Microsystems1, 188, 2002

Method of measuring the spatial resolution of a photoresist
JA Hoffnagle, WD Hinsberg, MI Sanchez, FA Houle
Optics letters 27(20), 1776--1778, Optical Society of America, 2002

High-NA lithographic imagery at Brewster's angle
T.A. Brunner, N. Seong, W.D. Hinsberg, J.A. Hoffnagle, F.A. Houle, M.I. Sanchez
Proceedings of SPIE, pp. 1, 2002


2001

Advanced semiconductor lithography-Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff
IBM Journal of Research and Development 45(5), 667--682, [Armonk, NY]: International Business Machines Corp., 2001

Nanoporous polyimides derived from highly fluorinated polyimide/poly (propylene oxide) copolymers
K.R. Carter, R.A. DiPietro, M.I. Sanchez, S.A. Swanson
Chemistry of materials 13(1), 213--221, ACS Publications, 2001

Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists
WD Hinsberg, FA Houle, MI Sanchez, GM Wallraff
Ibm Journal of Research and Development 45(5), 667--682, IBM, 2001


2000

Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
FA Houle, WD Hinsberg, M. Morrison, MI Sanchez, G. Wallraff, C. Larson, J. Hoffnagle
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures18, 1874, 2000

Modeling line edge roughness effects in sub 100 nanometer gate length devices
P. Oldiges, Q. Lin, K. Petrillo, M. Sanchez, M. Ieong, M. Hargrove
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on, pp. 131--134


1999

Liquid immersion deep-ultraviolet interferometric lithography
JA Hoffnagle, WD Hinsberg, M. Sanchez, FA Houle
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures17, 3306, 1999

Factors Controlling Pattern Formation in Chemically Amplified Resists at Sub-100 nm Dimensions
W. Hinsberg, F. Houle, G. Wallraff, M. Sanchez, M. Morrison, J. Hoffnagle, H. Ito, C. Nguyen, CE Larson, PJ Brock, others
Journal of Photopolymer Science and Technology12, 649--662, TECHNICAL ASSOC OF PHOTOPOLYMERS JAPAN, 1999


1998

Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
W. Hinsberg, FA Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, S. Frank
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures16, 3689, 1998


1997

Crosslinked polyimide foams derived from poly (imidepropylene oxide) copolymers
JL Hedrick, K. Carter, M. Sanchez, R. Di Pietro, S. Swanson, S. Jayaraman, JG McGrath
Macromolecular Chemistry and Physics 198(2), 549--559, Wiley Online Library, 1997

Polyimide nanofoams based on ordered polyimides derived from poly (amic alkyl esters): PMDA/4-BDAF
K.R. Carter, R.A. DiPietro, M.I. Sanchez, T.P. Russell, P. Lakshmanan, J.E. McGrath
Chemistry of materials 9(1), 105--118, ACS Publications, 1997

Low-stress polyimide block copolymers
JL Hedrick, HR Brown, W. Volksen, M. Sanchez, CJG Plummer, JG Hilborn
Polymer 38(3), 605--613, Elsevier, 1997


1996

Characterization of Low Dielectric Constant Polyimide
RM Briber, JS Fodor, TP Russell, KR Carter, JL Hedrick, MI Sanchez, RD Miller, A. Wong
APS March Meeting Abstracts, pp. 3216, 1996


High-temperature polyimide nanofoams for microelectronic applications
J.L. Hedrick, KR Carter, HJ Cha, CJ Hawker, RA DiPietro, JW Labadie, RD Miller, TP Russell, MI Sanchez, W. Volksen, others
Reactive and Functional Polymers 30(1-3), 43--53, Elsevier, 1996

Polyimides derived from nonaromatic monomers: synthesis, characterization and potential applications
W. Volksen, HJ Cha, MI Sanchez, DY Yoon
Reactive and Functional Polymers 30(1), 61--69, Elsevier, 1996


1995

Polyimide Nanofoams Prepared from Styrenic Block Copolymers
JL Hedrick, TP Russell, C. Hawker, M. Sanchez, K. Carter, R.A. DiPietro, R. Jerome
ACS Symposium Series, pp. 425--438, 1995

Polyimide nanofoams for low dielectric applications
KR Carter, HJ Cha, RA Dipietro, CJ Hawker, JL Hedrick, JW Labadie, JE McGrath, TP Russell, MI Sanchez, SA Swanson, others
MRS Proceedings, 1995


Nanofoam porosity by infrared spectroscopy
MI Sanchez, JL Hedrick, TP Russell
Journal of Polymer Science Part B: Polymer Physics 33(2), 253--257, Wiley Online Library, 1995


1994

Base-Catalyzed Photosensitive Polyimide
DR McKean, GM Wallraff, W Volksen, NP Hacker, MI Sanchez, JW Labadie
ACS Symposium Series, pp. 417--427, 1994


Year Unknown

Base-Catalyzed Cyclization of ortho-Aromatic Amide Alkyl Esters
W. Volksen, T. Pascal, JW Labadie, MI Sanchez
ACS Publications, ACS Publications, 0




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