Jeff Shearer  Jeff Shearer photo       

contact information

Interconnect Patterning
Semiconductor Technology Research, Albany, NY
  +1dash518dash292dash7468

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Professional Associations

Professional Associations:  American Vacuum Society


2017

Driving down defect density in composite EUV patterning film stacks
Meli, Luciana and Petrillo, Karen and De Silva, Anuja and Arnold, John and Felix, Nelson and Johnson, Richard and Murray, Cody and Hubbard, Alex and Durrant, Danielle and Hontake, Koichi and others
SPIE Advanced Lithography, pp. 101430Y--101430Y, 2017
Abstract

Comprehensive analysis of line-edge and line-width roughness for EUV lithography
Bonam, Ravi and Liu, Chi-Chun and Breton, Mary and Sieg, Stuart and Seshadri, Indira and Saulnier, Nicole and Shearer, Jeffrey and Muthinti, Raja and Patlolla, Raghuveer and Huang, Huai
SPIE Advanced Lithography, pp. 101431A--101431A, 2017
Abstract

An OCD perspective of line edge and line width roughness metrology
Bonam, Ravi and Muthinti, Raja and Breton, Mary and Liu, Chi-Chun and Sieg, Stuart and Seshadri, Indira and Saulnier, Nicole and Shearer, Jeffrey and Patlolla, Raghuveer and Huang, Huai
SPIE Advanced Lithography, pp. 1014511--1014511, 2017
Abstract

Single-expose patterning development for EUV lithography
De Silva, Anuja and Petrillo, Karen E and Meli, Luciana and Shearer, Jefferey C and Beique, Genevieve and Sun, Lei and Seshadri, Indira and Oh, Taehwan and Ayothi, Ramakrishnan and Saulnier, Nicole and others
SPIE Advanced Lithography, pp. 101431G--101431G, 2017
Abstract


2016

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels
Xie, R and Montanini, P and Akarvardar, K and Tripathi, N and Haran, B and Johnson, S and Hook, T and Hamieh, B and Corliss, D and Wang, J and others
Electron Devices Meeting (IEDM), 2016 IEEE International, pp. 2--7
Abstract


2015

Allylamine and Allyl Alcohol Plasma Copolymerization: Synthesis of Customizable Biologically-Reactive Three-Dimensional Scaffolds
Hawker, Morgan J and Pegalajar-Jurado, Adoracion and Hicks, Kiah I and Shearer, Jeffrey C and Fisher, Ellen R
Plasma Processes and Polymers 12(12), 1435--1450, Wiley Online Library, 2015
Abstract

N2/H2o Plasma Assisted Functionalization of Poly (a-caprolactone) Porous Scaffolds: Acidic/Basic Character versus Cell Behavior
Sardella, Eloisa and Fisher, Ellen R and Shearer, Jeffrey C and Garzia Trulli, Marta and Gristina, Roberto and Favia, Pietro
Plasma Processes and Polymers 12(8), 786--798, Wiley Online Library, 2015
Abstract


2013

Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles
Shearer, Jeffrey C and Fisher, Ellen R
Review of Scientific Instruments 84(6), 063904, AIP, 2013
Abstract


2012

Enhancing Surface Functionality of Supported Fe2O3 Nanoparticles Using Pulsed Plasma Deposition of Allyl Alcohol
Shearer, Jeffrey C and Fisher, Ellen R
Nanoscience and Nanotechnology Letters 4(3), 358--363, American Scientific Publishers, 2012
Abstract


2011

Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO2 Films Using Contact Angle Titrations and X-ray Photoelectron Spectroscopy
Trevino, Kristina J and Shearer, Jeffrey C and Tompkins, Brendan D and Fisher, Ellen R
Plasma Processes and Polymers 8(10), 951--964, Wiley Online Library, 2011
Abstract

Isoelectric points of plasma-modified and aged silicon oxynitride surfaces measured using contact angle titrations
Trevino, Kristina J and Shearer, Jeffrey C and McCurdy, Patrick R and Pease-Dodson, Shannon E and Okegbe, Christabel C and Fisher, Ellen R
Surface and Interface Analysis 43(9), 1257--1270, Wiley Online Library, 2011
Abstract


2010

Composite SiO 2/TiO 2 and amine polymer/TiO 2 nanoparticles produced using plasma-enhanced chemical vapor deposition
Shearer, Jeffrey C and Fisher, Mary J and Hoogeland, D and Fisher, Ellen R
Applied Surface Science 256(7), 2081--2091, Elsevier, 2010
Abstract