Hoa D. Truong  Hoa D. Truong photo       

contact information

Lithography process development
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash1674

links

Professional Associations

Professional Associations:  SPIE -- International Society of Optical Engineering


2006

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
R.D. Allen, P.J. Brock, C.E. Larson, D.P. Sanders, R. Sooriyakumaran, L.K. Sundberg, H.D. Truong, G.M. Wallraff
US Patent App. 11/380,731


2004

Photoresist composition
R.D. Allen, G. Breyta, P. Brock, R.A. DiPietro, D. Fenzel-Alexander, C. Larson, D.R. Medeiros, D. Pfeiffer, R. Sooriyakumaran, H.D. Truong, others
US Patent 6,806,026


2003

Molecular photoresists containing nonpolymeric silsesquioxanes
R D Allen, W Huang, M Khojasteh, Q Lin, D Pfeiffer, R Sooriyakumaran, H D Truong
US Patent App. 20,050/112,382


Year Unknown







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