Daniel (Dan) Sanders  Daniel  (Dan) Sanders photo       

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Manager - Lithography Materials and Hybrid Polymeric Materials
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash2604

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Professional Associations

Professional Associations:  American Chemical Society


2013


Semiconductor interconnect structure having enhanced performance and reliability
Jr. Cabral Cyril, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Takeshi Nogami, Daniel P. Sanders
US Patent App 20130075908



2012


Method for designing optical lithography masks for directed self-assembly
Joy Cheng, Kafai Lai, Wai-kin Li, Young-Hye Na, Jed Walter Pitera, Charles Thomas Rettner, Daniel Paul Sanders, Da Yang
US Patent 8,336,003


2011



Aligning polymer films
J. Cheng, D.P. Sanders, R. Sooriyakumaran, others
US Patent 7,906,031


Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
J. Cheng, D.L. Goldfarb, D.R. Medeiros, D.P. Sanders, D. Pfeiffer, L. Vyklicky
US Patent 20,110,300,483

Self-topcoating photoresist for photolithography
R. Allen, P. Brock, S. Kusumoto, Y. Nishimura, D.P. Sanders, M.S. Slezak, R. Sooriyakumaran, L.K. Sundberg, H. Trung, G.M. Wallraff, others
US Patent 7,951,524



2010

SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE
D.P. Sanders, M. Fujiwara, Y. Terui
US Patent App. 12/709,346

METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES
J. Cheng, H. Namai, D.P. Sanders
US Patent App. 12/913,835




METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES
J. Cheng, H. Namai, C.T. Rettner, D.P. Sanders, R. Sooriyakumaran
US Patent App. 12/957,008

POLYMERS BEARING PENDANT PENTAFLUOROPHENYL ESTER GROUPS, AND METHODS OF SYNTHESIS AND FUNCTIONALIZATION THEREOF
M. Fujiwara, J.L. Hedrick, A. Nelson, D.P. Sanders, Y. Terui, M. Yasumoto
US Patent App. 12/770,857

Functionalized carbosilane polymers and photoresist compositions containing the same
R.D. Allen, M.E. Colburn, D.P. Sanders, R. Sooriyakumaran, H.D. Truong
US Patent App. 12/938,459


Graded spin-on organic antireflective coating for photolithography
C.J. Brodsky, S.D. Burns, D.L. Goldfarb, M. Lercel, D.R. Medeiros, D. Pfeiffer, D.P. Sanders, S.A. Scheer, L. Vyklicky, others
US Patent 7,816,069

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
R.D. Allen, P. Brock, D.P. Sanders, L.K. Sundberg
US Patent App. 12/687,380


2009

Methods of directed self-assembly and layered structures formed therefrom
Joy Cheng, William D Hinsberg, Hiroshi Ito, Atsuko Ito, Ho-cheol Kim, Young-Hye Na, Daniel P Sanders, Linda Karin Sundberg, Hoa D Truong, Gregory Michael Wallraff, others
US Patent App. 12/641,959

Impurity reduction in Olefin metathesis reactions
C.W. Lee, S.H. Hong, D.P. Sanders, R.H. Grubbs, R.L. Pederson, others
US Patent 7,507,854

METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED THEREFROM
J. Cheng, M.E. Colburn, S. Harrer, W.D. Hinsberg, S.J. Holmes, KIM Ho-Cheol, D.P. Sanders
US Patent App. 12/642,018


Method of Ring-Opening Polymerization, and Related Compositions and Articles
O. Coulembier, J.L. Hedrick, A. Nelson, J.E. Rice, D.P. Sanders
US Patent App. 12/475,700


Method of forming polymer features by directed self-assembly of block copolymers
K. Cheng, B.B. Doris, P. Kulkarni, G. Shahidi
US Patent App. 12/542,771


2008

ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY
D.L. Goldfarb, L. Vyklicky, S.D. Burns, D.R. Medeiros, D.P. Sanders, R.D. Allen
US Patent App. 12/018,541

METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS
J. Cheng, W.D. Hinsberg, H.C. Kim, C.T. Rettner, D.P. Sanders
US Patent App. 12/061,693


METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES
J. Cheng, D.P. Sanders, R. Sooriyakumaran
US Patent App. 12/058,006


2006

Cross-metathesis reaction of functionalized and substituted olefins using group 8 transition metal carbene complexes as metathesis catalysts
R.H. Grubbs, A.K. Chatterjee, T.L. Choi, S.D. Godberg, J.A. Love, J.P. Morgan, D.P. Sanders, M. Scholl, F.D. Toste, T.M. Trnka, others
US Patent App. 11/559,399

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
R.D. Allen, P.J. Brock, C.E. Larson, D.P. Sanders, R. Sooriyakumaran, L.K. Sundberg, H.D. Truong, G.M. Wallraff
US Patent App. 11/380,731


2005

Latent, high-activity olefin metathesis catalysts containing an N-heterocyclic carbene ligand
T. Ung, Y. Schrodi, M.S. Trimmer, A. Hejl, D. Sanders, R.H. Grubbs
US Patent App. 11/094,102