Daniel (Dan) Sanders  Daniel  (Dan) Sanders photo       

contact information

Manager - Lithography Materials and Hybrid Polymeric Materials
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash2604

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Professional Associations

Professional Associations:  American Chemical Society


2015

Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films
Michael J Maher, Charles T Rettner, Christopher Bates, Gregory Blachut, Matthew C Carlson, William J Durand, Christopher J Ellison, Daniel P Sanders, Joy Y Cheng, C Grant Willson
ACS applied materials \& interfaces, ACS Publications, 2015


2014

Directed Self-assembly of Topcoat-free, Integration-friendly High-$\chi$ Block Copolymers
Ankit Vora, Anindarupa Chunder, Melia Tjio, Srinivasan Balakrishman, Elizabeth Lofano, Joy Cheng, Daniel P Sanders, Eri Hirahara, Yasushi Akiyama, Orest Polishchuk, others
Journal of Photopolymer Science and Technology 27(4), 419--424, The Society of Photopolymer Science and Technology (SPST), 2014

Enabling complex nanoscale pattern customization using directed self-assembly
Gregory S Doerk, Joy Y Cheng, Gurpreet Singh, Charles T Rettner, Jed W Pitera, Srinivasan Balakrishnan, Noel Arellano, Daniel P Sanders
Nature communications5, Nature Publishing Group, 2014

Spin-on organic hardmask materials for topo-patterned substrate
Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, others
SPIE Advanced Lithography, pp. 905115--905115, 2014



2013

Accessing New Materials through Polymerization and Modification of a Polycarbonate with a Pendant Activated Ester
Amanda C Engler, Julian MW Chan, Daniel J Coady, Jeannette M O’Brien, Haritz Sardon, Alshakim Nelson, Daniel P Sanders, Yi Yan Yang, James L Hedrick
Macromolecules 46(4), 1283--1290, ACS Publications, 2013

Defects on high-resolution negative-tone resist: The revenge of the blobs
MI Sanchez, LK Sundberg, LD Bozano, R Sooriyakumaran, DP Sanders, T Senna, M Tanabe, T Komizo, I Yoshida, AE Zweber
SPIE Photomask Technology, pp. 88800V--88800V, 2013

Deterministically isolated gratings through the directed self-assembly of block copolymers
Gregory S Doerk, Joy Y Cheng, Charles T Rettner, Srinivasan Balakrishnan, Noel Arellano, Daniel P Sanders
SPIE Advanced Lithography, pp. 86800Y--86800Y, 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications
H Tsai, H Miyazoe, S Engelmann, CC Liu, L Gignac, J Bucchignano, D Klaus, C Breslin, E Joseph, J Cheng, D Sanders, M Guillorn
J. Micro/Nanolith. MEMS MOEMS., 2013

Synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl carbonate intermediate
Daniel P Sanders, Daniel J Coady, Manabu Yasumoto, Masaki Fujiwara, Haritz Sardon, James L Hedrick
Polym. Chem. 5(2), 327--329, The Royal Society of Chemistry, 2013


2012

Special Section Guest Editorial: Directed Self-Assembly
D.P. Sanders, W.H. Arnold
Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031301--1, International Society for Optics and Photonics, 2012

Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
Gregory S Doerk, Chi-Chun Liu, Joy Y Cheng, Charles T Rettner, Jed W Pitera, Leslie Krupp, Teya Topuria, Noel Arellano, Daniel P Sanders
SPIE Advanced Lithography, pp. 83230P--83230P, 2012


Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy
Gregory S Doerk, Chi-Chun Liu, Joy Y Cheng, Charles T Rettner, Jed W Pitera, Leslie E Krupp, Teya Topuria, Noel Arellano, Daniel P Sanders
ACS nano 7(1), 276--285, ACS Publications, 2012

Directed self-assembly defectivity assessment. Part II
C. Bencher, H. Yi, J. Zhou, M. Cai, J. Smith, L. Miao, O. Montal, S. Blitshtein, A. Lavi, K. Dotan, others
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, pp. 13, 2012


2011

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab
C. Bencher, J. Smith, L. Miao, C. Cai, Y. Chen, J.Y. Cheng, D.P. Sanders, M. Tjio, H.D. Truong, S. Holmes, others
Proc. SPIE, pp. 79700F, 2011


2010

High contact angle fluorosulfonamide-based materials for immersion lithography
D.P. Sanders, L.K. Sundberg, M. Fujiwara, Y. Terui, M. Yasumoto
SPIE Advanced Lithography, pp. 763925--763925, 2010

Self-assembling materials for lithographic patterning: overview, status, and moving forward
W. Hinsberg, J. Cheng, H.C. Kim, D.P. Sanders
SPIE Advanced Lithography, pp. 76370G--76370G, 2010

Advances in patterning materials for 193 nm immersion lithography
D.P. Sanders
Chemical reviews 110(1), 321, 2010

Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Fritz, S. Holmes, M. E. Colburn, W. D. Hinsberg
J. Am. Chem. Soc. Nano, ACS Publications, 2010

A simple and efficient synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl ester intermediate
D.P. Sanders, K. Fukushima, D.J. Coady, A. Nelson, M. Fujiwara, M. Yasumoto, J.L. Hedrick
Journal of the American Chemical Society, ACS Publications, 2010


2009

The Photopolymer Science and Technology Award
D.L. Goldfarb, L. Vylicky, S.D. Burns, K. Petrillo, J. Arnold, A. Lisi, D. Pfeiffer, D.P. Sanders, R.D. Allen, D.R. Medeiros, others
Journal of Photopolymer Science and Technology 22(1), 7--11, J-STAGE, 2009

Hydrogen-Bonding Catalysts Based on Fluorinated Alcohol Derivatives for Living Polymerization
Coulembier, Olivier; Sanders, Daniel P.; Nelson, Alshakim; Hollenbeck, Andrew N.; Horn, Hans W.; Rice, Julia E.; Fujiwara, Masaki; Dubois, Philippe; Hedrick, James L.
Angew. Chem. Int. Ed., Engl. 48(28), 5170, Wiley Online Library, 2009


2008

The limitations of high index resists for 193nm hyper-NA lithography
G. McIntyre, D. Sanders, R. Sooriyakumaran, H. Truong, R. Allen
HJ Levinson, MV Dusa, Proc. of SPIE6923, 692304, 2008

Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
D.L. Goldfarb, L. Vyklicky, S.D. Burns, K. Petrillo, J. Arnold, A. Lisi, D. Pfeiffer, D.D. Sanders, R.D. Allen, D.R. Medeiros, others
Journal of Photopolymer Science and Technology 21(3), 397--404, J-STAGE, 2008

Graded spin-on organic bottom antireflective coating for high NA lithography
D.L. Goldfarb, S.D. Burns, L. Vyklicky, D. Pfeiffer, A. Lisi, K. Petrillo, J. Arnold, D.P. Sanders, A. Clancy, R.N. Lang, others
Proceedings of SPIE, the International Society for Optical Engineering, pp. 69230V--1, 2008

Integration of polymer self-assembly for lithographic application
J.Y. Cheng, D.P. Sanders, H.C. Kim, L.K. Sundberg
Integration of polymer self-assembly for lithographic application,” Proc. SPIE6921, 692127, 2008

Self-segregating materials for immersion lithography
D.P. Sanders, L.K. Sundberg, P.J. Brock, H. Ito, H.D. Truong, R.D. Allen, G.R. McIntyre, D.L. Goldfarb
Proc. SPIE Int. Soc. Opt. Eng, pp. 692309, 2008



2007

Contact angles and structure/surface property relationships of immersion materials
L.K. Sundberg, D.P. Sanders, R. Sooriyakumaran, P.J. Brock, R.D. Allen
Advanced Lithography, pp. 65191Q--65191Q, 2007

New materials for surface energy control of 193 nm photoresists
D. Sanders, L. Sundberg, H. Ito, P. Brock, R. Sooriyakumaran, H. Truong, R. Allen
4th International Symposium on Immersion Lithography, Keystone, Colorado, USA, 2007

Fundamental analysis of nanoparticle-based high index immersion fluids
J. Hoffnagle, D. Milliron, S. Swanson, D. Sanders, B. Hinsberg
4th International Symposium on Immersion Lithography, Keystone, CO, pp. 8--11, 2007

High refractive index polymer platforms for 193nm immersion lithography
R. Sooriyakumaran, DP Sanders, H. Truong, RD Allen, ME Colburn, GR McIntyre
4th Intl. Symp. on Immersion Lithography, Keystone Colorado, USA, 2007


2006

Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography
AD Allen, G. Breyta, P. Brock, R. DiPietro, D. Sanders, R. Sooriyakumaran, LK Sundberg
Journal of Photopolymer Science and Technology 19(5), 569--572, J-STAGE, 2006


2005


Prevention of undesirable isomerization during olefin metathesis
S.H. Hong, D.P. Sanders, C.W. Lee, R.H. Grubbs
Journal of the American Chemical Society 127(49), 17160--17161, ACS Publications, 2005


2003

Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography
B.C. Trinque, C.R. Chambers, B.P. Osborn, R.P. Callahan, G.S. Lee, S. Kusumoto, D.P. Sanders, R.H. Grubbs, W.E. Conley, C.G. Willson
Journal of fluorine chemistry 122(1), 17--26, Elsevier, 2003

Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo [4.2. 1.02, 5] non-7-enes
D.P. Sanders, E.F. Connor, R.H. Grubbs, R.J. Hung, B.P. Osborn, T. Chiba, S.A. MacDonald, C.G. Willson, W. Conley
Macromolecules 36(5), 1534--1542, ACS Publications, 2003

A general model for selectivity in olefin cross metathesis
A.K. Chatterjee, T.L. Choi, D.P. Sanders, R.H. Grubbs
Journal of the American Chemical Society 125(37), 11360--11370, ACS Publications, 2003


2002

Synthesis of symmetrical trisubstituted olefins by cross metathesis
A.K. Chatterjee, D.P. Sanders, R.H. Grubbs
Organic letters 4(11), 1939--1942, ACS Publications, 2002

Comparison of optical coherence tomography, X-ray computed tomography, and confocal microscopy results from an impact damaged epoxy/E-glass composite
J.P. Dunkers, D.P. Sanders, D.L. Hunston, M.J. Everett, W.H. Green
The Journal of Adhesion 78(2), 129--154, Taylor \& Francis, 2002

Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results
H.V. Tran, R.J. Hung, T. Chiba, S. Yamada, T. Mrozek, Y.T. Hsieh, C.R. Chambers, B.P. Osborn, B.C. Trinque, M.J. Pinnow, others
Macromolecules 35(17), 6539--6549, ACS Publications, 2002


2001

The prediction of permeability for an epoxy/E-glass composite using optical coherence tomographic images
J.P. Dunkers, F.R. Phelan, C.G. Zimba, K.M. Flynn, D.P. Sanders, R.C. Peterson, R.S. Parnas, X. Li, J.G. Fujimoto
Polymer composites 22(6), 803--814, Wiley Online Library, 2001

The application of optical coherence tomography to problems in polymer matrix composites
J.P. Dunkers, F.R. Phelan, D.P. Sanders, M.J. Everett, W.H. Green, D.L. Hunston, R.S. Parnas
Optics and lasers in engineering 35(3), 135--147, Elsevier, 2001


Resist materials for 157-nm microlithography: an update
R.J. Hung, H.V. Tran, B.C. Trinque, T. Chiba, S. Yamada, D. Sanders, E.F. Connor, R.H. Grubbs, J.M. Klopp, J.M.J. Frechet, others
Proc. SPIE, pp. 385, 2001


2000


Improved thermal and mechanical properties of polybenzoxazines based on alkyl-substituted aromatic amines
H. Ishida, D.P. Sanders
Journal of Polymer Science Part B: Polymer Physics 38(24), 3289--3301, Wiley Online Library, 2000


1999

Regioselective influence of alkyl-substituted arylamines on the network structure in polybenzoxazines
D.P. Sanders
Ph.D. Thesis, 1999


1998

New quantitative optical depth profiling methods by attenuated total reflectance Fourier transform infrared spectroscopy: Multiple angle/single frequency and single angle/multiple frequency approaches
H. Ishida, S. Ekgasit, D.P. Sanders
AIP Conference Proceedings, pp. 40, 1998


Year Unknown

Directed Self-Assembly
D.P. Sanders, W.H. Arnold
proceedings.spiedigitallibrary.org, 0

IMAGING OF COMPOSITE DEFECTS AND DAMAGE USING OPTICAL COHERENCE TOMOGRAPHY
J.P. Dunkers, M.J. Everett, D.P. Sanders, D.L. Hunston
JP Dunkers, MJ Everett, DP Sanders..., 0

Directed Polymer Self-assembly for Lithography Application
J.Y. Cheng, D.P. Sanders, C.T. Rettner, H. Truong, W.D. Hinsberg, H.C. Kim, R.D. Allen
JY Cheng, DP Sanders, CT Rettner, H Truong..., 0