Charles J. Taft  Charles J. Taft photo       

contact information

Senior Engineer - Semiconductor Equipment Development
NFE IBM Suite, Albany, NY
  +1dash518dash300dash0701

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2015

Partial solution replacement in recyclable persulfuric acid cleaning systems
Henry, Richard O and Hilscher, David F and Merritt, Sandi E and Taft, Charles J and Zigner Jr, Robert W
US Patent 9,165,801
Abstract

Partial solution replacement in recyclable persulfuric acid cleaning systems
Henry, Richard O and Hilscher, David F and Merritt, Sandi E and Taft, Charles J and Zigner Jr, Robert W
US Patent 8,992,691
Abstract


2008

Variable exhaust static pressure management apparatus
Biagetti, Michael R and Taft, Charles J
US Patent 7,354,874
Abstract


2007

Method for the rapid thermal control of a work piece in liquid or supercritical fluid
Simons, John P and McCullough, Kenneth J and Moreau, Wayne M and Cotte, John M and Pope, Keith R and Taft, Charles J and Goldfarb, Dario
US Patent 7,288,155
Abstract


2003

Process of drying a cast polymeric film disposed on a workpiece
Goldfarb, Dario L and McCullough, Kenneth John and Medeiros, David R and Moreau, Wayne M and Simons, John P and Taft, Charles J
US Patent 6,509,136
Abstract

Topcoat process to prevent image collapse
Simons, John P and McCullough, Kenneth J and Moreau, Wayne M and Taft, Charles J
US Patent 6,656,666
Abstract

Apparatus and method for increasing throughput in fluid processing
McCullough, Kenneth J and Moreau, Wayne M and Simons, John P and Taft, Charles J and Cotte, John M
US Patent 6,561,220
Abstract

Apparatus and method for wet cleaning
Taft, Charles J and McCullough, Kenneth J and Ouimet, George F and Rath, David L and Zigner Jr, Robert W
US Patent 6,584,989
Abstract

Process for cleaning a workpiece using supercritical carbon dioxide
Jur, Jesse Stephen and McCullough, Kenneth J and Moreau, Wayne Martin and Simons, John Patrick and Taft, Charles Jesse
US Patent 6,558,475
Abstract


2002

Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide
Cotte, John and Fisch, Emily and McCullough, Kenneth and Moreau, Wayne and Okorn-Schmidt, Harald and Pope, Keith and Simons, John and Syverson, William and Taft, Charles
US Patent App. 10/124,842
Abstract

Process of cleaning semiconductor processing, handling and manufacturing equipment
Cotte, John Michael and Goldfarb, Dario L and McCullough, Kenneth John and Moreau, Wayne Martin and Pope, Keith R and Simons, John P and Taft, Charles J
US Patent 6,454,869
Abstract

Process for depositing a film on a nanometer structure
Cotte, John Michael and McCullough, Kenneth John and Moreau, Wayne Martin and Simons, John P and Taft, Charles J
US Patent 6,451,375
Abstract

Process of drying semiconductor wafers using liquid or supercritical carbon dioxide
Cotte, John Michael and Goldfarb, Dario L and McCullough, Kenneth John and Moreau, Wayne Martin and Pope, Keith R and Simons, John P and Taft, Charles J
US Patent 6,398,875
Abstract

Process for removing chemical mechanical polishing residual slurry
Cotte, John Michael and Delehanty, Donald J and McCullough, Kenneth John and Moreau, Wayne Martin and Simons, John P and Taft, Charles J and Volant, Richard P
US Patent 6,425,956
Abstract