Jaione Tirapu Azpiroz  Jaione Tirapu Azpiroz photo       

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Researcher
IBM Research - Brazil, Rio de Janeiro, RJ, 22290-240

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Professional Associations

Professional Associations:  IEEE  |  SPIE -- International Society of Optical Engineering


2017

Dielectrophoretic microbead sorting using modular electrode design and capillary-driven microfluidics
Tirapu-Azpiroz, Jaione and Temiz, Yuksel and Delamarche, Emmanuel
Biomedical Microdevices 19(4), 95, Springer, 2017
Abstract


2015

Arraying single microbeads in microchannels using dielectrophoresis-assisted mechanical traps
Jaione Tirapu-Azpiroz, Yuksel Temiz and Emmanuel Delamarche
Applied Physics Letters 107, 204102, 2015

Reversible Single Particle Trapping in Microchannels
Jaione Tirapu Azpiroz, Yuksel Temiz, Emmanuel Delamarche
V Workshop in Microfluidics, CNPEM, Campinas, SP, Brasil, 2015


2014

Electrokinetic Modeling for Particle Trapping at the Microscale.
Jaione Tirapu Azpiroz, Yuksel Temiz, Emmanuel Delamarche, Ricardo Ohta, Claudius Feger
IV Workshop in Microfluidics, CNPEM, Campinas, SP, Brasil, 2014

Layout optimization method to equalize the best-focus position of different patterns
Jaione Tirapu-Azpiroz, Alan E. Rosenbluth and Timothy Brunner
J. Micro/Nanolith. MEMS MOEMS 13(2), 020502, 2014


2013


Benchmarking study of 3D mask modeling for 2X and 1X nodes
ChangAn Wang, ChaoChun Liang, Chidam Kallingal, Derren Dunn, James Oberschmidt, Jaione Tirapu Azpiroz.
Proc. SPIE 8683, 8683-45, 2013


2012

Process Optimization through Model Based SRAF Printing Prediction
Ramya Viswanathan, Jaione Tirapu Azpiroz, Punitha Selvam.
Proc. SPIE 8326, 83261A , 2012

Computational Lithography Using the Finite-Difference Time-Domain Method
Geoffrey W. Burr, Jaione Tirapu Azpiroz
Advances in FDTD Computational Electrodynamics: Photonics and Nanotechnology. Ed. A. Taflove, A. Oskooi, S.G. Johnson, Artech House, 2012


2011

Applicability of global source mask optimization to 22/20nm node and beyond
K. Tian, M. Fakyry, A. Dave, A. Tritchkov, J. Tirapu-Azpiroz, A.E. Rosenbluth, D. Melville, M. Sakamoto, T. Inoue, S. Mansfield, others
Proceedings of SPIE7973, 79730C, 2011

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
D.O.S. Melville, A.E. Rosenbluth, A. Waechter, M. Millstone, J. Tirapu-Azpiroz, K. Tian, K. Lai, T. Inoue, M. Sakamoto, K. Adam, others
Journal of Vacuum Science \& Technology B 29(6), American Institute of Physics, 2011

The Advancement of Predictive Modeling in Lithography, Part 2
Kafai Lai, Dario Gil, Scott Mansfield, Tim Farrell, Jaione Tirapu-Azpiroz, Jason Meiring, Geng Han, Derren Dunn, Alan Rosenbluth
Future Fab Intl.37, 2011

Radiometric Consistency in Source Specifications for Photolithography
Alan E. Rosenbluth, Jaione Tirapu Azpiroz, Kafai Lai, Kehan Tian, David O.S. Melville
Computational Optical Sensing and Imaging, OSA Technical Digest (CD), pp. CWC1, 2011

Evaluation of the Accuracy of Complex Illuminator Designs
Michael S. Hibbs, Jaione Tirapu Azpiroz, Kazunori Seki, Gregory McIntyre, Shinpei Kondo
Proc. SPIE 8166, 81661W-1, 2011
Best Paper Award, Advanced Photomask Conference 2011.

Computational Lithography : Exhausting the limits of 193-nm Projection Lithography Systems
D. Melville, A. Rosenbluth, A. Waechter, K. Tian, J. Tirapu-Azpiroz, K. Lai, T. Inoue, M. Sakamoto, K. Adam, and A. Tritchkov.
Journal Vacuum Science and Technology B29(6), 06FH04-1, 2011


2010

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
Melville, David and Rosenbluth, Alan E and Tian, Kehan and Lai, Kafai and Bagheri, Saeed and Tirapu-Azpiroz, Jaione and Meiring, Jason and Halle, Scott and McIntyre, Greg and Faure, Tom and others
SPIE Advanced Lithography, pp. 764006--764006, 2010
Abstract

Demonstrating the Benefits of Source-Mask Optimization and Enabling Technologies through Experiment and Simulation
David Melville, Alan E. Rosenbluth, Kehan Tian, Kafai Lai, Saeed Bagheri, Jaione Tirapu-Azpiroz, Young Kim et. al.
Proc. SPIE7640, 764006-1, 2010

Understanding the Trade-offs of Thinner Binary Mask Absorbers
Jaione Tirapu Azpiroz, Gregory McIntyre, Tom Faure, Scott Halle, Michael Hibbs, Alfred Wagner, Kafai Lai, Emily Gallagher, Timothy Brunner
Proc. SPIE7823, 78230M-1, 2010

Applicability of Global Source Mask Optimization to 22/20-nm Node
Kehan Tian, Moutaz Fakhry, Aasutosh Dave, Alexander Tritchkov, Jaione Tirapu-Azpiroz, Alan E. Rosenbluth, David Melville et. al.
Proc. of SPIE7973, 79730C, 2010

The Advancement of Predictive Modeling in Lithography, Part 1
Kafai Lai, Dario Gil, Scott Mansfield, Tim Farrell, Jaione Tirapu-Azpiroz, Jason Meiring, Geng Han, Derren Dunn, Alan Rosenbluth
Future Fab Intl.35, 2010

Lithographic Qualification of New Opaque MoSi Binary Mask Blank for the 32-nm Node and beyond
Greg McIntyre, Michael Hibbs, Jaione Tirapu-Azpiroz, Geng Han, Scott Halle, Tom Faure, Ryan Deschner, Brad Morgenfeld, Sridhar Ramaswamy, Alfred Wagner, Tim Brunner and Yasutaka Kikuchi
Journal Micro/Nanolith., MEMS, MOEMS Vol. 9(1), 013010, 2010


2009

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
Lai, Kafai and Rosenbluth, Alan E and Bagheri, Saeed and Hoffnagle, John and Tian, Kehan and Melville, David and Tirapu-Azpiroz, Jaione and Fakhry, Moutaz and Kim, Young and Halle, Scott and others
SPIE Advanced Lithography, pp. 72740A--72740A, 2009
Abstract

Benefits and trade-offs of global source optimization in optical lithography
Tian, Kehan and Krasnoperova, Azalia and Melville, David and Rosenbluth, Alan E and Gil, Dario and Tirapu-Azpiroz, Jaione and Lai, Kafai and Bagheri, Saeed and Chen, Chia-chen and Morgenfeld, Bradley
SPIE Advanced Lithography, pp. 72740C--72740C, 2009
Abstract

Improving yield through the application of process window OPC
Jaione Tirapu-Azpiroz, Azalia Krasnoperova, Shahab Siddiqui, Kenneth Settlemyer, Ioana Graur and Ian P. Stobert
Proc. SPIE7274, 727411, 2009


Intensive Optimization of Masks and Sources for 22nm Lithography
Alan E Rosenbluth, David O Melville, Kehan Tian, Saeed Bagheri, Jaione Tirapu-Azpiroz, Kafai Lai, Tadanobu Inoue, Laszlo Ladanyi et. al.
Proc. SPIE7274, 727409, 2009

Experimental Result and Simulation Analysis for the Use of Customized Illumination From Source Mask Optimization for 22nm Logic Lithography Process
Kafai Lai, Alan E Rosenbluth, Saeed Bagheri, John Hoffnagle, Jaione Tirapu-Azpiroz, Kehan Tian, et. al.
Proc. SPIE7274, 72740A-1, 2009

Benefits and Trade-Offs of Global Source Optimization Optical Lithography
Kehan Tian, Azalia Krasnoperova, David O Melville, Alan E Rosenbluth, Jaione Tirapu-Azpiroz, Kafai Lai, Saeed Bagheri, Chia-chen Chen, Bradley J Morgenfeld
Proc. SPIE7274, 72740C, 2009

Isotropic Treatment of EMF Effects in Advanced Photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, Ioana Graur, Geoffrey W. Burr, Gustavo Villares
Proc. SPIE7488, 74882D, 2009

SMO Photomask Inspection in the Lithographic Plane
Emily Gallagher, Karen Badger, Yutaka Kodera, Jaione Tirapu Azpiroz, Ioana Graur et. al.
Proc. SPIE7488, 748807 , 2009


2008

Radiometric Consistency in Source Specifications for Lithography
Alan E. Rosenbluth, Jaione Tirapu-Azpiroz, Kafai Lai, Kehan Tian, David O.S. Melville, Michael Totzeck, Vladan Blahnik, Armand Koolen, and Donis Flagello
Proc. SPIE6924, 69240V, 2008

Massively-Parallel FDTD Simulations to Address Mask Electromagnetic Effects in Hyper-NA Immersion Lithography
Jaione Tirapu-Azpiroz, Geoffrey W. Burr, Alan E. Rosenbluth and Michael Hibbs.
Proc. SPIE6924, 69240Y, 2008

Wafer Plane Inspection Evaluated for Photomask Production
Emily Gallagher, Karen Badger, Mark Lawliss, Yutaka Kodera, Jaione Tirapu-Azpiroz, Song Pang, Hongqin Zhang, Eugenia Eugenieva, Chris Clifford, Arosha Goonesekera and Yibin Tian
Proc. SPIE7122 , 71221B, 2008
Best Paper Award, Advanced Photomask Conference 2008


2007

Modeling Polarization for Hyper-NA Lithography Tools and Masks
Kafai Lai, Alan E. Rosenbluth, Geng Han, Jaione Tirapu-Azpiroz, Jason Meiring, Aksel Goehnermeier, Bernhard Kneer, Michael Totzeck, Laurens de Winter, Wim de Boeij and Mark van de Kerkhof
Proc. SPIE6520, 65200D , 2007

Critical Impact of EMF Effects on RET and OPC Performance for 45nm and Beyond
Tirapu Azpiroz, A. E. Rosenbluth, K. Lai, C. Fonseca, and D. Yang.
Journal Vacuum Science and Technology B25, 164, 2007


2006

Characterization of Imaging Performance for Immersion Lithography at NA=0.93
Dario Gil, Jaione Tirapu-Azpiroz, Ryan Deschner, Timothy Brunner, Carlos Fonseca, Jennifer Fullam, Dan Corliss, Kit Auschnitt
Proc. SPIE6154, 615405, 2006

Incorporating Mask Topography Edge Diffraction in Photolithography Simulations
J. Tirapu Azpiroz, E. Yablonovitch
Journal of the Optical Society of America A 23(4), 821 , 2006


2005

Inspection of Integrated Circuit Databases Through Reticle and Wafer Simulation: An Integrated Approach to Design For Manufacturability (DfM)
W. Howard, J. Tirapu-Azpiroz, Y. Xiong, C. Mack, G. Verma, W. Volk, H. Lehon, Y. Deng, R f Shi, J. Culp and S. Mansfield
Proc. SPIE5756, 61 , 2005


2004

Fast evaluation of photomask near-fields in sub-wavelength 193nm lithography
Tirapu-Azpiroz, Jaione and Yablonovitch, Eli
Proc. of SPIE Vol, pp. 1529, 2004



2003

Boundary Layer Model to Account For Thick Mask Effects in Photolithography
Jaione Tirapu Azpiroz, Paul Burchard and Eli Yablonovitch
Proc. SPIE5040, 1611, 2003

Modeling of Near-Field effects in Sub-Wavelength Deep Ultra-Violet Lithography
Jaione Tirapu Azpiroz, E. Yablonovitch
Future Trends of Microelectronics, Ed. S. Luryi, J.Xu and A. Zaslavsky., Wiley-IEEE Press, 2003


2000

Method of Moments Analysis of 2 Dimensional Photonic Bandgap Structures fabricated via Dielectric Cylinders
Jaione Tirapu Azpiroz
ESTEC Working Paper No. 2104, TOS-EEA, European Space Agency Publications., 2000


1999

Study of the Delay Characteristics of 1-D Photonic BandGap Micro-Strip Structures
J. Tirapu Azpiroz, T. Lopetegi, M.A.G. Laso, M. J. Erro, F. Falcone and M.Sorolla.
Microwave and Optical Technology Letters 23(6), 346, 1999