Urs Duerig is a Research Staff Member in the Nanofabrication group at IBM Research - Zurich, Rueschlikon, where is working on projects in the area of maskless lithography using local probes. His general research interest is in the field of nanometer-scale physics and nanotechnology using scanning probe techniques.
He received his PhD from the ETH Zurich in 1984. He then joined IBM as a post-coc working on the development of scanning optical near-field microscopy in Dieter Pohl's group. In 1985, he became a Research Staff Member. He has worked in a wide range of fields spanning the study of tip–surface interactions using a combination of scanning tunneling and force microscopy, theory of dynamic force microscopy, metal layer epitaxy, nano-indentation, electrical and mechanical properties of metal contacts, thermoelectric properties of micro-scale devices, and mechanical signal processing. In recent years, his research focus has been on the application of scanning probe techniques for data storage and maskless lithography using polymeric resist materials.