Michal Zientek  Michal Zientek photo       

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Zurich Research Laboratory, Zurich, Switzerland



Michal Zientek joined IBM Zurich Research Laboratory in March 2013 as a graduate student (pre-doc) at Nanofabrication group.

In his research, Michal focuses on fabrication of 3D structures using thermal Scanning Probe Lithography (tSPL), a method developed to create high resolution, three-dimensional structures with unprecedented quality. In this technique a hot Atomic Force Microscopy tip is used to locally evaporate an organic resist. Possibilities of usage tSPL method for the fabrication of novel high performance photonic devices are under Michal's investigation.

Michal Zientek studied Electrical Engineering at Wroclaw University of Technology (Poland), during his studies, he spent several months at Interuniversity Microelectronic Centre, IMEC (Leuven, Belgium) where he was developing specialized software for improving the cooperation between technologists and users of several MEMS technologies. Later in his studies, he joined European Organization for Nuclear Research, CERN (Geneva, Switzerland) where he worked in Physics Department, investigating physical parameters of Micro-Pattern Gaseous Detectors for the future CMS at LHC upgrade. After being graduated Michal Zientek remained at CERN’s Technology Department as Fellow where he was responsible for the fabrication of Gas Electron Multiplier particle detectors for the various high energy physics experiments.

In his free time Michal enjoys rock climbing and skiing.