Robert L. Bruce  Robert L. Bruce photo       

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Next Generation Plasma Processing
Thomas J. Watson Research Center, Yorktown Heights, NY USA

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Professional Associations

Professional Associations:  American Vacuum Society

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Research Staff Member at IBM T.J. Watson Research Center

Ph.D. in Materials Science & Engineering, University of Maryland, College Park
advisor: Professor Gottlieb S. Oehrlein

B.S. in Materials Science & Engineering, University of Illinois, Urbana-Champaign


Dr. Bruce is a research scientist at IBM T.J. Watson Research Center whose focus is on advanced plasma processing and patterning technologies for next generation nanoscale devices. During his tenure at IBM, he has conducted research on the frontiers of photonics, biosensors, photovoltaics, memory and semiconductor technologies. He is an inventor of 15 issued/pending patents and an author of more than 30 refereed publications.

His current focus is on patterning strategies for:

-III-V semiconductors
-phase change memory
-atomic layer etching
-bionanotechnology
-carbon nano-devices
-directed self-assembly

 

 




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