Professional AssociationsProfessional Associations: Alpha Sigma Mu - International Honor Society for Materials Science and Engineering | American Association for the Advancement of Sciences | American Chemical Society | IEEE | Materials Research Society (MRS) | New York Academy of Science | SPIE -- International Society of Optical Engineering | Tau Beta Pi
Call-for-papers: Submit papers to semiconductor technology and materials conferences in 2017
IBM computer to take on humans in the Jeopardy Challenge on February 14 - 16, 2011.
Dr.Qinghuang Lin is a Research Staff Member, Sr. Manager and IBM Master Inventor at IBM T.J. Watson Research Center. His research interests center on materials, nanofabrication and integration for electronic devices and systems as well as novel applications of electronic devices and systems, including life sciences and healthcare. For more information or questions about his work, please contact him using his contact information listed above.
For more than twenty years, Dr. Qinghuang Lin has held a variety of research and engineering positions in advanced lithography, resist materials, BEOL materials, BEOL integration, 3D integration for DRAM technologies as well as 0.25 um to 5 nm node CMOS logic technologies and other exploratory research, including DNA sequencing, novel memories and quantum computing at IBM. A frequent organizer and speaker of professional conferences at ACS, MRS, SPIE and SEMI, Dr. Lin is the editor or co-editor of 2 books and 6 conference proceedings volumes and the author and co-author of over 60 technical papers. He holds more than 90 issued US patents with more than 70 US patents pending. He has received 25 IBM Invention Plateau Achievement Awards. He is an Associate Editor of Journal of Micro/Nanolithography, MEMS, and MOEMS and served as a Guest Editor of Journal of Materials Research focus issue on self-assembly and directed assembly of advanced materials. In 2002, Dr. Lin was a co-recipient of an IBM Research Division Award for "invention, development and implementation of 248 nm bilayer resist technology in manufacturing." This IBM 248 nm bilayer resist technology was part of the 40 years of innovations in semiconductor technology that won IBM 2004 US National Medal of Technology -- the highest honor awarded by the President of the United States to America's leading innovators. In 2015, Dr. Lin, along with colleagues, received an IBM Research Division Outstanding Achievement Award for “Spin Torque Magnetic Random Access Memory (MRAM).”
In 2014, Dr. Lin was named a Fellow of the American Chemical Society (ACS Fellow). In 2015, he was named a Fellow of the Division of Polymeric Materials Science and Engineering (PMSE), American Chemical Society (PMSE Fellow). In 2017, Dr. Lin was named a Fellow of The International Society for Optical Engineering (SPIE Fellow).
A member of AAAS, ACS, IEEE, MRS, SPIE and New York Academy of Sciences, Dr. Qinghuang Lin currently serves as Chair of the American Chemical Society: Polymeric Materials Science and Engineering (PMSE) division. He also served on the Electorate Nominating Committee, Industrial Science and Technology Section of the American Association for the Advancement of Science (AAAS), the Executive Committee of the American Chemical Society: Polymeric Materials Science and Engineering (PMSE) division and Co-chair of PMSE Fellows Selection Committee. He is a member of the Executive Committee of the SPIE Advanced Lithography Symposium and is a past chairman of the SPIE Resist Conference. In addition, Dr. Lin is a member of two engineering honor societies: Tau Beta Pi and Alpha Sigma Mu.
Dr. Qinghuang Lin received his B.E. and M.S. degrees from Tsinghua University, Beijing, China and his Ph.D. degree from the University of Michigan, Ann Arbor, Michigan, USA. He was a post-doctoral fellow at the University of Texas at Austin prior to joining IBM. He also completed a MicroMBA Program at IBM Watson Research Center.